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Preparation Of Crystalline Chromium Carbide Thin Films Synthesized By Pulsed Nd:YAG Laser Deposition

Published online by Cambridge University Press:  10 February 2011

Kazuya Doi ,
Satoshi Hiraishi ,
Hiroharu Kawasaki  and
Yoshiaki Suda
Kazuya Doi
Affiliation:
Department of Electrical Engineering, Sasebo National College of Technology, Okishin 1-1, Sasebo, Nagasaki 857-1193, Japan
Satoshi Hiraishi
Affiliation:
Department of Electrical Engineering, Sasebo National College of Technology, Okishin 1-1, Sasebo, Nagasaki 857-1193, Japan
Hiroharu Kawasaki
Affiliation:
Department of Electrical Engineering, Sasebo National College of Technology, Okishin 1-1, Sasebo, Nagasaki 857-1193, Japan
Yoshiaki Suda
Affiliation:
Department of Electrical Engineering, Sasebo National College of Technology, Okishin 1-1, Sasebo, Nagasaki 857-1193, Japan
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Abstract

Chromium carbide thin films are synthesized on Si(100) substrates by a pulsed Nd:YAG laser deposition (PLD) method as parameters of methane gas pressure. Glancing-angle X-ray diffraction patterns show that the film prepared by PLD method is a polycrystalline thin film composed of Cr3C2and Cr7C3, even in the base pressure. Diffraction patterns, however, are depended on the methane gas pressure. Grain size of the prepared film increases with increasing methane gas pressure. One of the reasons of these phenomena may be considered to the phase reaction between the ablated species, such as Cr, CrCx and CH4gas in the plasma plume.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 617: Symposium J – Laser-Solid Interactionsfor Materials Processing , 2000 , J7.8
Copyright
Copyright © Materials Research Society 2000

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