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Plasmon Printing – a New Approach to Near-Field Lithography

Published online by Cambridge University Press:  15 March 2011

Pieter G. Kik ,
Stefan A. Maier  and
Harry A. Atwater
Pieter G. Kik
Affiliation:
Thomas J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125, USA
Stefan A. Maier
Affiliation:
Thomas J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125, USA
Harry A. Atwater
Affiliation:
Thomas J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125, USA
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Abstract

We propose a method for replicating patterns with a resolution well below the diffraction limit, using broad beam illumination and standard photoresist. In particular it is shown that visible exposure (λ=410 nm) of silver nanoparticles in close proximity to a thin film of g-line resist (AZ 1813) can produce selectively exposed areas with a diameter smaller than λ/20. The technique relies on the local field enhancement around metal nanostructures when illuminated at the surface plasmon resonance frequency. The method can be extended to various metals, photosensitive layers, and particle shapes.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 705: Symposium Y – Nanopatterning–From Ultralarge-Scale Integration to Biotechnology , 2001 , Y3.6
Copyright
Copyright © Materials Research Society 2002

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