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Picosecond Nonlinear Optical Response of Copper Clusters Created by Ion Implantation in Fused Silica

Published online by Cambridge University Press:  15 February 2011

R. H. Magruder III
Affiliation:
Magruder, Haglund, Yang, Wittig, BeckerDepartment of Materials Science and EngineeringVanderbilt University, Nashville, TN 37235
R. F. Haglund Jr.
Affiliation:
Department of Physics and Astronomy, Vanderbilt University, Nashville, TN 37235
L. Yang
Affiliation:
Department of Physics and Astronomy, Vanderbilt University, Nashville, TN 37235
J. E. Wittig
Affiliation:
Magruder, Haglund, Yang, Wittig, BeckerDepartment of Materials Science and EngineeringVanderbilt University, Nashville, TN 37235
K. Becker
Affiliation:
Department of Physics and Astronomy, Vanderbilt University, Nashville, TN 37235
R. A. Zuhr
Affiliation:
Zuhr Solid-State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
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Abstract

We have embedded nm-size Cu clusters in optically dense, thin (∼ 150 nm) layers using standard ion implantation techniques. The size and size distribution of the clusters can be altered by varying such ion-implantation parameters as total dose and current density. The layers exhibit both a thermo-optic and an electronic nonlinear optical response, depending on the mode of laser excitation. The electronic nonlinearity has a response time no longer than 5 ps.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

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