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Nanofabrication of Diamond-like Carbon Templates for Nanoimprint Lithography

Published online by Cambridge University Press:  01 February 2011

L. Tao ,
S. Ramachandran ,
C. T. Nelson ,
L. J. Overzet ,
M. J. Goeckner ,
G. S. Lee  and
W. Hu
L. Tao
Affiliation:
University of Texas at Dallas, Electrical Engineering, 2601 N.Floyd Rd., PO Box 830688, EC 33, Richardson, TX, 75083, United States, 972-883-6329, 972-883-2710
S. Ramachandran
Affiliation:
sreedhar@student.utdallas.edu, University of Texas at Dallas, Department of Electrical Engineering, Richardson, TX, 75083, United States
C. T. Nelson
Affiliation:
caleb.t.nelson@gmail.com, University of Texas at Dallas, Department of Electrical Engineering, Richardson, TX, 75083, United States
L. J. Overzet
Affiliation:
overzet@utdallas.edu, University of Texas at Dallas, Department of Electrical Engineering, Richardson, TX, 75083, United States
M. J. Goeckner
Affiliation:
goeckner@utdallas.edu, University of Texas at Dallas, Department of Electrical Engineering, Richardson, TX, 75083, United States
G. S. Lee
Affiliation:
gslee@utdallas.edu, University of Texas at Dallas, Department of Electrical Engineering, Richardson, TX, 75083, United States
W. Hu
Affiliation:
walter.hu@utdallas.edu, University of Texas at Dallas, Department of Electrical Engineering, Richardson, TX, 75083, United States
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Abstract

Diamond like carbon (DLC) films were deposited on Si and then patterned to form 40 nm features as nanoimprint templates. A plasma enhanced chemical vapor deposition (PECVD) system with CH4 precursor was used to deposit DLC films on Si and quartz substrates. Then these films were characterized using Raman spectroscopy, atomic force microscopy (AFM), nanoindentation, and contact angle measurement. By varying the RF power and pressure of the PECVD, DLC films with good uniformity, smooth surfaces (<0.2 nm RMS), low surface energy (∼40 mJ/m2), and high hardness (∼22 GPa) were achieved. Nanoimprint lithography and liftoff process were used to pattern Cr mask on DLC films. An inductively coupled plasma (ICP) etching process was performed with CF4 to transfer the patterns into the DLC films to form nanostructured template for nanoimprint. Water contact angles on the patterned DLC templates were measured and it was stable at about 70° under thermal annealing at 180 °C for more than 12 hours. With these DLC templates, UV and reversal UV nanoimprint lithography were carried out on SU-8 at typical imprint conditions and then the fidelity of pattern-transfer was investigated. These experimental results indicate that DLC is an excellent material for nanoimprint templates because of its high wear resistance, robust low surface energy, UV transparency, and ease of patterning.

Keywords

plasma-enhanced CVD (PECVD) (deposition)nanostructurediamond
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 956: Symposium J – Diamond Electronics—Fundamentals to Applications , 2006 , 0956-J13-04
Copyright
Copyright © Materials Research Society 2007

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References

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