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Multilayer Mirrors For X-Ray Lithography
Published online by Cambridge University Press: 15 February 2011
Abstract
The applications of multilayer x-ray mirrors to x-ray lithography are reviewed. Topics included are: multilayer performance and characterization, testing and fabrication of large mirrors with figure errors in the Angstrom range, multilayer x-ray masks, and collimators.
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- Copyright © Materials Research Society 1993
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