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MULTILAYER ANODIZATION PROFILE (MAP) A NOVEL DEPTH PROFILE TECHNIQUE FOR METALLIC–BASED LAYERED STRUCTURES

Published online by Cambridge University Press:  28 February 2011

A.M. KADIN ,
R.W. BURKHARDT  and
J.E. KEEM
A.M. KADIN
Affiliation:
Ovonic Synthetic Materials Co., division of Energy Conversion Devices, Inc., Troy, MI 48084
R.W. BURKHARDT
Affiliation:
Ovonic Synthetic Materials Co., division of Energy Conversion Devices, Inc., Troy, MI 48084
J.E. KEEM
Affiliation:
Ovonic Synthetic Materials Co., division of Energy Conversion Devices, Inc., Troy, MI 48084
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Abstract

A simple and inexpensive technique is described, which makes novel use of electrolytic anodization to obtain an effective depth profile of artificial nultilayered structures based on a number of refractory metals. Successful MAPs (Multilayer Anodization Profiles) have been obtained for multilayer structures of Nb/Si, W/Ti, and a variety of other material pairs, with individual layer spacings ranging from less than 10 Å to greater than 50 Å. The spatial resolution of these MAPs annears to be less than about 10 Å, and may in some cases be comparable to the interface sharpness of the sputtered films. Comparison with conventional techniques such as Auger depth profiling and low–angle x-ray diffraction is discussed. Examples of semiquantitative analysis, using the MAP technique, of changes in interface structure brought about by thermal annealing, are also presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 56: Symposium H – Layered Structures and Epitaxy , 1985 , 473
Copyright
Copyright © Materials Research Society 1986

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References

1. Young, L., Anodic Oxide Films (Academic Press, 1961).Google Scholar
2. Kroger, H., Smith, L.N., and Jillie, D.U., Appl. Phys. Lett. 3q, 280 (1981).Google Scholar
3. Palmer, D.U. and Decker, S.K., Pev. Sci. Instrum. 44, 1621 (1973).CrossRefGoogle Scholar
4. Kadin, A.M., Burkhardt, R.W., Keem, J.E., and Chen, J.T., Bull. An. Phys. Soc. 30, 349 (1985).Google Scholar
5. Ilugglns, H.A. and Gurvitch, N., J. Appl. Phys. 57, 2103 (1985).Google Scholar
6. Curvitch, M., private communication.Google Scholar
7.Marcel Pourbaix, Atlas of Electrochemical Equilibria In Aqueous Solutions (Pergamon Press, Oxford 1966).Google Scholar
8.Wood, Grupido, N., Hart, K., Flessa, q., A. Kadin,. Keem, T., and Ferris, D., in Proc. MRS Symn. on Layered Structures and Epitaxy, Roston, Dec. 3-6, 1985.Google Scholar
9.Yasuo Takagi, Pawlik, D., Kadin, A., Flessa, S., K.Hart,. Veen, T., and Tyler, J., in Proc. MRS Symru. on Layered Structures and Epitaxy, Roston, Dec. 3-6, 189.Google Scholar
10. Kadin, A.M. and Keem, J.R., to appear In “Viewpoint Set on Multitayer Structures”, Scripta Metallurgica (1996).Google Scholar
11. Perriere, J., Rigo, S., and Siejka, J., 3. Etectrochem. Soc. 125, 1549 (1978).Google Scholar
12. Pringle, J.P.S., Fi.ectrochinica Acta 25, 1403–1437 (1980).Google Scholar