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MOCVD Growth Of GaxIn1−xAs1−ySby and GaxIn1−xSb ALLOYS: Effect of Growth Parameters on Their Solid Compositions

Published online by Cambridge University Press:  10 February 2011

Baolin Zhang ,
Tianming Zhou ,
Hong Jiang ,
Yongqiang Ning ,
Shuwei Li  and
Yixin Jin
Baolin Zhang
Affiliation:
Changchun Institute of Physics, Chinese Academy of Sciences, Changchun 130021, People's Republic of China
Tianming Zhou
Affiliation:
Changchun Institute of Physics, Chinese Academy of Sciences, Changchun 130021, People's Republic of China
Hong Jiang
Affiliation:
Changchun Institute of Physics, Chinese Academy of Sciences, Changchun 130021, People's Republic of China
Yongqiang Ning
Affiliation:
Changchun Institute of Physics, Chinese Academy of Sciences, Changchun 130021, People's Republic of China
Shuwei Li
Affiliation:
Changchun Institute of Physics, Chinese Academy of Sciences, Changchun 130021, People's Republic of China
Yixin Jin
Affiliation:
Changchun Institute of Physics, Chinese Academy of Sciences, Changchun 130021, People's Republic of China
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Abstract

Quaternary GaxIn1−xAs1−ySby and ternary GaxIn1−xSb alloys have been grown by metalorganic chemical vapor deposition (MOCVD). The effects of growth parameters on the solid compositions, x, y for GaxIn1−xAs1−ySby and x for GaxIn1−x Sb alloys are described in detail. Concentrations of the reactants have major effects on the corresponding solid compositions in the two kinds of alloys. The growth temperature dependence of the solid compositions in both GaxIn1−xAs1−ySby and GaxIn1−xSb was obviously observed and the growth kinetic factor was considered to account for this dependence. It was found that III/V ratio in vapor has a great effect on x in GaxIn1−xSb alloy but little effect on x and y in GaxIn1−xAs1−ySby alloy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 415: Symposium BB – Metal-Organic Chemical Vapor Deposition of Electronic Ceramics II , 1995 , 37
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

1. Bhan, J., Joullie, A., Mani, H., Joullie, A.M. and Alibert, C., SPIE 866, 126(1987).Google Scholar
2. Zyskind, J.L., Dewinter, J.C., Burrus, C.A., Centanni, J.C., Dentai, A.G. and Pollack, M.A., Electron. Lett. 25, 558(1989).Google Scholar
3. Aardvark, A., Allogho, G. G., Bougnot, G., David, J. P. R., Gianl, A., Haywood, S.K., Hill, G., Klipstein, P.C., Mansoor, F., Mason, N.J., Nicholas, R.J., Pascal-Delannoy, F., Pate, M., Ponnampalam, L. and Walker, P.J., Semicond. Sci. Technol. 8, s380 (1993).Google Scholar
4. Srivastava, A.K., dewinter, J.C., Caneau, C., Pollack, M.A. and Zyskind, J.L., Appl. Phys. Lett. 48, 903(1986).Google Scholar
5. Zhang, B., Zhou, T., Jiang, H., Ning, Y. and Jin, Y., Electron. Lett. 31, 830(1995).Google Scholar
6. Bougnot, G.J., Foucaran, A.F., Marjan, M., Etienne, D., Bougnot, J., Delannoy, F.M.H. and Roumanille, F.M., J. Cryst. Growth, 77, 400(1986).Google Scholar
7. Chidley, E.T.R., Haywood, S.K., Mallard, R.E., Mason, N.J., Nicholas, R.J., Walker, P.J. and Warburton, R.J., J. Cryst. Growth, 93, 70(1988).Google Scholar
8. Su, Y.K. and Juang, F.S., J. Electrochem. Soc. 139, 629(1992).Google Scholar
9. Baolin, Zhang, Tianming, Zhou, Hong, Jiang, Yongqiang, Ning, Yixin, Jin, Chunrong, Hong and Jinshan, Yuan, J. Cryst. Growth, 151, 21(1995).Google Scholar
10. Bougnot, G., Delannoy, F., Foucaran, A., Pascal, F., Roumaiille, F., Grosse, P. anti Bougnot, J., J. Electrochem. Soc. 135, 1783(1988).Google Scholar
11. Tianming, Zhou, Baolin, Zhang, Yixin, Jin, Hong, Jiang and Yongqiang, Ning, Rare Metals (Chinese Journal, in English), 11, 190(1992).Google Scholar
12. Chemg, M.J., Jen, H.R., Larsen, C.A. and Stringfellow, G.B., J. Cryst. Growth, 77, 408 (1986).Google Scholar
13. Cooper, C.B. III, Saxena, P.R. and Ludowise, M.J., J. Electron. Mater. 11, 1001 (1982).Google Scholar
14. Kuo, C.P., Cohen, R.M., Fry, K.L. and Stringfellow, G.B., J. Electron. Mater. 14 231(1985).Google Scholar
15. Stringfellow, G.B., J. Cryst. Growth, 68, 111(1984).Google Scholar
16. Fukui, T. and Horikoshi, Y., Jap. J. Appl. Phys. 19, L53 (1980).Google Scholar
17. Bedair, S.M., Timmous, M.L. and Chiang, P.K., J. Electron. Mater. 16, 959(1987).Google Scholar