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Microstructure and Phase Composition of Sputter-Deposited Zirconia-Yttria Films

Published online by Cambridge University Press:  15 February 2011

R.W. Knoll  and
E.R. Bradley
R.W. Knoll
Affiliation:
Pacific Northwest Laboratory, Richland, Washington 99352.
E.R. Bradley
Affiliation:
Pacific Northwest Laboratory, Richland, Washington 99352.
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Abstract

Thin ZrO2 -Y2 O3 coatings ranging in composition from 3 to 15 mole % Y2 O3 were produced by rf sputter deposition. This composition range spanned the region on the equilibrium ZrO2 -Y2O3 phase diagram corresponding to partially stabilized zirconia (a mixture of tetragonal ZrO2 and cubic solid solution). Microstructural characteristics and crystalline phase composition of as-deposited and heat treated films (1100°C and 1500°C) were determined by transmission electron microscopy (TEM) and by x-ray diffraction (XRD). Effects of substrate bias (0 ∼ 250 volts), which induced ion bombardment of the film during growth, were also studied. The as-deposited ZrO2-Y2O3 films were single phase over the composition range studied, and XRD data indicated considerable local atomic disorder in the lattice. Films produced at low bias contained intergranular voids, pronounced columnar growth, and porosity between columns. At high bias, the microstructure was denser, and films contained high compressive stress. After heat treatment, all deposits remained single phase, therefore a microstructure and precipitate distribution characteristic of toughened, partially stabilized zirconia appears to be difficult to achieve in vapor deposited zirconia coatings.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 30: Symposium L – Plasma Processing and Synthesis of Materials I , 1983 , 235
Copyright
Copyright © Materials Research Society 1984

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References

REFERENCES

1. Chopra, K.L., Thin Film Phenomena (McGraw-Hill, 1969) Ch. IV.Google Scholar
2. Kingery, W.D., Bowen, H.K. and Uhlmann, D.R., Introduction to Ceramics (John Wiley and Sons, 1976, second edition) Ch. 6.Google Scholar
3. Mattox, D.M. and Kominiak, F.J., J. Vac. Sci. Tech. 9 (1972) 528–532.Google Scholar
4. Miller, R.A., Smialek, J.L., and Garlick, R.G. in Ref. 15, 241–253.Google Scholar
5. Bratton, R.J. and Lau, S.K. in Ref. 15, 226–240.Google Scholar
6. Bill, R.C., Sovey, J. and Allen, G.P., Thin Solid Films 84 (1981) 95–104.Google Scholar
7. Benner, R.E. and Nagelberg, A.S., Thin Solid Films 84 (1981) 89–94.Google Scholar
8. Valentine, P.G. and Meier, R.D., NASA-CR-165126, (1980).Google Scholar
9. Patten, J.W., Bayne, M.A., Hays, D.D., Moss, R.W., McClanahan, E.D., and Fairbanks, J.W., Thin Solid Films 64 (1979) 337–343.Google Scholar
10. Barr, T.L., Welsh, L.B., Szofran, F.R., Greene, J.E. and Klinger, R.E., J. Vac. Sci. Tech. 15 (1978) 341.Google Scholar
11. Croset, M., Schnell, P., Velasco, G. and Siejka, J., J. Vac. Sci. Tech. 14 (1977) 777–781 Google Scholar
11a. J. Appl. Phys. 48 (1977) 775–780.Google Scholar
12. Greene, J.E., Klinger, R.E., Welsh, L.B. and Szofran, F.R., J. Vac. Sci. Tech. 14 (1977) 177–180.Google Scholar
13. Greene, J.E., Wickersham, C.E., Zilko, J.L., Welsh, L.B., and Szofran, F.R., J. Vac. Sci. Tech. 13 (1976) 72–75.Google Scholar
14. Pawlewicz, W.T. and Hays, D.D., Thin Solid Films 94 (1982) 31.Google Scholar
15. Heuer, A.H. and Hobbs, L.W. (editors), Advances in Ceramics Vol 3, The Science and Technology of Zirconia (American Ceramic Society, 1981).Google Scholar
16. Subbarao, E.C. in Ref. 15, 1–24.Google Scholar
17. Stubican, V.S., Hink, R.C., and Ray, S.P., J. Amer. Ceram. Soc. 61 (1978) 17–21.Google Scholar
18. Garvie, R.C., Hannink, R.H., and Pascoe, R.T., Nature 258 (1975) 703–704.Google Scholar
19. Bansal, G.K. and Heuer, A.H., J. Amer. Ceram. Soc. 58 (1975) 235–238.Google Scholar
20. Pawlewicz, W.T., J. Appl. Phys. 49 (1978) 5595–5601.Google Scholar
21. Scott, H.G., J. Mater. Sci. 10 (1975) 1527–1535.Google Scholar
22. Gupta, T.K., Bechtold, J.H., Kuznicki, R.C., Cadoff, L.H., and Rossing, B.R., J. Mater. Sci. 12 (1977) 2421–2426.Google Scholar
23. Marder, J.M., Mitchell, T.E. and Heuer, A.H., Acta. Metall. 31 (1983) 387–395.Google Scholar
24. Knoll, R.W. and McClanahan, E.D., J. Vac. Sci. Tech. A–1 (1983) 271–274.Google Scholar