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Micromechanical Properties of He-Implanted Ni

Published online by Cambridge University Press:  11 February 2011

J. A. Knapp
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185–1056
D. M. Follstaedt
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185–1056
S. M. Myers
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185–1056
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Abstract

Detailed finite-element modeling of nanoindentation data is used to obtain the micromechanical properties of Ni implanted with ∼5 at.% He to a depth of 600–700 nm. Properties of He-containing metals have implications for studies of radiation damage and for fundamental issues of dislocation pinning. Cross-section TEM shows the implantation produces a highly damaged layer containing a fine dispersion of He bubbles with diameters of ∼1 nm or smaller, with some evidence for interconnection between bubbles. Nanoindentation of the Ni(He) layers gave a fairly hard, stiff response to depths of 100–120 nm, beyond which the layer failed. By modeling the layer as an isotropic, elastic-plastic solid with the Mises yield criterion, the Ni(He) is shown to have a hardness nearly 7 times that of untreated Ni. However, unlike other treatments that we have used to produce very hard Ni-based layers, the Ni(He) layer fails at relatively modest shear stress levels.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

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