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Methane Plasma Source Ion Implanted Ti-6Al-4V
Published online by Cambridge University Press: 21 February 2011
Abstract
Ti-6Al-4V alloy test coupons were ion implanted using methane Plasma Source Ion Implanter at an energy of 30 KeV. Multi-energy ion implantation, carbon film deposition as well as ion beam mixing were involved in this process. The resulted carbon profile is flat-top near the surface which forms a TiC layer. The implanted layer has demonstrated high load capacity and long life time under pin on disk wear test condition.
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- Copyright © Materials Research Society 1991