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Mesostructured Silica Films with Metal Oxide Doped Pore Walls

Published online by Cambridge University Press:  17 March 2011

Joachim Koehler ,
Jun Cai ,
Rolf Juergen Behm  and
Nicola Huesing
Joachim Koehler
Affiliation:
Institute of Inorganic Chemistry I, Ulm University, Ulm, 89081, Germany
Jun Cai
Affiliation:
Institute of Surface Chemistry and Catalysis, Ulm University, Ulm, 89081, Germany
Rolf Juergen Behm
Affiliation:
Institute of Surface Chemistry and Catalysis, Ulm University, Ulm, 89081, Germany
Nicola Huesing
Affiliation:
Institute of Inorganic Chemistry I, Ulm University, Ulm, 89081, Germany
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Abstract

In this work, novel approaches towards mixed metal oxide mesostructured films by a combination of evaporation-induced self-assembly and sol-gel processing of deliberately designed precursor molecules (from single source precursors to metal-surfactant complexes) are reported. The focus lies on Ti-oxide doped silica films with in a wide range variable Ti to Si ratios. The ligand-assisted templating based on metal-coordinated surfactants allows a selective positioning of the metal species in the silica wall which is advantageous for many catalytic applications. For the synthesis of these metal doped silica films, a non-ionic polyether-based surfactant (Brij56) was simultaneously used as the structure-directing agent and ligand for the respective metal-alkoxide, such as titanium isopropoxide. These metal-coordinated surfactants were mixed with a prehydrolyzed silica-solution based on tetraethoxysilane and ethanol and spin- or dip coated. In the second approach, a single source precursor for network formation based on 3-acetyl-6-trimethoxysilylhexane-2-one that was coordinated to titanium isopropoxide was synthesized. This precursor was either used as network forming agent in the presence of tetraethoxysilane and a surfactant (Brij56) or in combination with the metal-coordinated surfactant to broaden the accessible range of the Si:Ti ratios. The final films were characterized by XRD, XPS, nitrogen porosimetry and TEM.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1007: Symposium S – Organic/Inorganic Hybrid Materials-2007 , 2007 , 1007-S04-12
Copyright
Copyright © Materials Research Society 2007

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References

REFERENCES

1 Garcia, C., Zhang, Y., DiSalvo, F., Wiesner, U., Angew. Chem. Int. Ed. 42, 1526 (2003).Google Scholar
2 Matsura, V., Guari, Y., Larionova, J., Guerin, C., Caneschi, A., Sangregorio, C., Lancelle-Beltran, E., Mehdi, A., Corriu, R.J.P., J. Mater. Chem. 14, 3026 (2004).Google Scholar
3 Tura, C., Coombs, N., Dag, Ö., Chem. Mater. 17, 573 (2005).Google Scholar
4 Lu, Y., Ganguli, R., Drewien, C.A., Anderson, M.T., Brinker, C.J., Gong, W., Guo, Y., Soyez, H., Dunn, B., Huang, M.H., Zink, J.I., Nature, 389, 364 (1997).Google Scholar
5 Supplit, R., Hüsing, N., Bertagnolli, H., Bauer, M., Kessler, V., Seisenbaeva, G.A., Bernstorff, S., Gross, S., J. Mater. Chem. 16, 4443 (2006).Google Scholar
6 Hüsing, N., Launay, B., Hofer, F., Kickelbick, G., J. Sol-Gel Sci. Technol. 26, 615 (2003).Google Scholar
7 Hüsing, N., Launay, B., Kickelbick, G., Gross, S., Armelao, L., Bottaro, G., Feth, M., Bertagnolli, H., Hofer, F., Kothleither, G., Appl. Catal. 254, 297 (2003).Google Scholar
8 Andrianainarivelo, M., Corriu, R., Leclercq, D., Mutin, P.H., Vioux, A., J. Mater. Chem. 6, 1665 (1996).Google Scholar
9 Puchberger, M., Rupp, W., Bauer, U., Schubert, U., New J. Chem. 28, 1289 (2004).Google Scholar
10 Matsura, V., Guari, Y., Larionova, J., Guérin, C., Caneschi, A., Sangregorio, C., Lancelle-Beltran, E., Mehdi, A., Corriu, R.J.P., J. Mater. Chem. 14, 3026 (2004).Google Scholar
11 Brinker, C.J., Lu, Y., Sellinger, A., Fan, H., Adv. Mater. 11, 579 (1999).Google Scholar