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Mechanical Polishing to Submicron Thickness for Extensive Thin Area in Heterogeneous Samples

Published online by Cambridge University Press:  16 February 2011

David F. Dawson-Elli
Affiliation:
Materials Science Program, University of Wisconsin, Madison, WI 53706
Marek A. Turowski
Affiliation:
Materials Science Program, University of Wisconsin, Madison, WI 53706
Thomas F. Kelly
Affiliation:
Department of Materials Science and Engineering
Yeon-Wook Kim
Affiliation:
Department of Materials Science and Engineering
Nuri A. Zreiba
Affiliation:
Department of Materials Science and Engineering
Tens Chen-Ming
Affiliation:
Department of Materials Science and Engineering
Zhou Mei
Affiliation:
Department of Materials Science and Engineering
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Abstract

Ion-milling-based sample preparation has the advantage that thin area can be obtained from almost any material. It has the disadvantage, however, that the amount of thin area can often be quite limited. This poses a problem when a large sampling area is needed from materials which must be thinned by ion milling. Cross-sectioned samples and grossly heterogeneous materials are two examples where this problem may be encountered. The group at IBM in East Fishkill have developed methods for mechanical grinding and polishing of TEM samples down to about I micron thickness. They use this as a starting point for final thinning by ion milling. This approach produces a large uniform thin area in a short time in the ion mill. We have built jigs that allow us to make these mechanically-thinned samples. We have also made flat-bottomed dimples using ultra-precision dimple grinders to achieve similar results. Both of these approaches are described. Examples are taken from cross-section samples of thin films on silicon, from steels with large carbides, and from rapidly solidified metal spheres embedded in electroplated copper.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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References

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