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Magnetic Permeability and Relaxation Frequency in High Frequency Magnetic Materials.

Published online by Cambridge University Press:  21 March 2011

M.I. Rosales ,
H. Montiel  and
R. Valenzuela
M.I. Rosales
Affiliation:
Institute for Materials Research, National University of MexicoP.O. Box 70-360, Mexico D.F., 04510, Mexico
H. Montiel
Affiliation:
Institute for Materials Research, National University of MexicoP.O. Box 70-360, Mexico D.F., 04510, Mexico
R. Valenzuela
Affiliation:
Institute for Materials Research, National University of MexicoP.O. Box 70-360, Mexico D.F., 04510, Mexico
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Abstract

An investigation of the frequency behavior of polycrystalline ferrites is presented. It is shown that the low frequency dispersion (f < 10 MHz) of permeability is associated with the bulging of pinned domain walls, and has a mixed resonance-relaxation character, closer to the latter. It is also shown that there is a linear relationship between the magnetocrystalline anisotropy constant, K1, and the relaxation frequency. The slope of this correlation depends on the grain size. Such a relationship could allow the determination of this basic parameter from polycrystalline samples.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 674: Symposia T/U/V – Applications of Ferromagnetic and Optical Materials, Storage and Magnetoelectronics , 2001 , U1.8
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

1. Valenzuela, R., Magnetic Ceramics, Cambridge University Press p. 255 (1994)Google Scholar
2. Rosales, M.I., Amano, E., Cuautle, M.P. and Valenzuela, R., Mat. Sci. Eng. B49, 221 (1997).Google Scholar
3. Nakamura, T., J. App. Phys. 88, 348 (2000).10.1063/1.373666Google Scholar
4. Nakamura, T., Tsutaoka, T. and Hatekamaya, K., J. Magn Magn. Mat. 138, 319 (1994).Google Scholar
5. Valenzuela, R. and Irvine, J.T.S., J. Appl. Phys. 72, 1486 (1992).Google Scholar
6. Ciureanu, P., Aykel, C., Britel, M.R., Ménard, D., Melo, L.G.C., Yelon, A., Valenzuela, R. and Rudkowski, P., Proceedings of the 1999 Asia-Pacific Microwave Conference, Singapore, Dec. 2-5, vol. 3 p. 876 (2000).Google Scholar
7. Groenou, B. von and Schulkes, J.A., J. App. Phys. 38, 1133 (1967).10.1063/1.1709512Google Scholar
8. Valenzuela, R. and Irvine, J.T.S., J. Magn Magn. Mat. 160, 386 (1996).Google Scholar