Hostname: page-component-8448b6f56d-t5pn6 Total loading time: 0 Render date: 2024-04-20T00:48:51.487Z Has data issue: false hasContentIssue false
  • English
  • Français

Low Pressure Photo-Assisted Mocvd for the Production of Homogeneous, Low-Strain, Amorphous Titanium Oxide Films

Published online by Cambridge University Press:  10 February 2011

P.W. Haycock ,
M.G. Lopez ,
J. Auld ,
J.W. Bull  and
E.W. Williams
P.W. Haycock
Affiliation:
Birchall Centre for Inorganic Chemistry and Materials Science, School of Chemistry and Physics, Lennard-Jones Laboratories, Keele University, Staffordshire, ST5 5BG, UK
M.G. Lopez
Affiliation:
Birchall Centre for Inorganic Chemistry and Materials Science, School of Chemistry and Physics, Lennard-Jones Laboratories, Keele University, Staffordshire, ST5 5BG, UK
J. Auld
Affiliation:
Birchall Centre for Inorganic Chemistry and Materials Science, School of Chemistry and Physics, Lennard-Jones Laboratories, Keele University, Staffordshire, ST5 5BG, UK
J.W. Bull
Affiliation:
Birchall Centre for Inorganic Chemistry and Materials Science, School of Chemistry and Physics, Lennard-Jones Laboratories, Keele University, Staffordshire, ST5 5BG, UK
E.W. Williams
Affiliation:
Birchall Centre for Inorganic Chemistry and Materials Science, School of Chemistry and Physics, Lennard-Jones Laboratories, Keele University, Staffordshire, ST5 5BG, UK
Get access

Abstract

Thin films of titania have been grown by photo-assisted MOCVD which are amorphous and relatively strain free, with high refractive index, low optical loss and structural features all less than 100 nm in size. The stoichiometry is very close to TiO2 and the impurity content is negligible except for a small amount of calcium, thought to have been leached from the glass substrate. The optimum deposition conditions were found to involve a deposition temperature of around 200 °C, a cell pressure of 5.6 torr and the introduction of nitrous oxide, decomposed by UV irradiation to give oxygen free radicals which acted as an oxidant.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 616: Symposium I – New Methods, Mechanisms & Models of Vapor Deposition , 2000 , 53
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Feuersanger, A.E., Proc. IEEE, Dec. 1964, p. 1463.10.1109/PROC.1964.3430Google Scholar
2 Fuyuki, T., Kobayashi, T. and Matsunami, H., J. Electrochem Soc. 135, 248 (1988).10.1149/1.2095566Google Scholar
3 Toyoda, M. and Sugimoto, K., J. Jpn. Inst. Met. 54, 925 (1990).10.2320/jinstmet1952.54.8_925Google Scholar
4 Chang, H.L.M., You, H., Gao, Y., Foster, C.M., Chiarello, R.P., Zhang, T.J. and Lam, D.J., J. Mat. Res. 7, 2495 (1992).10.1557/JMR.1992.2495Google Scholar
5 Kamata, K., Amano, S., Fukasawa, H., Maruyama, K. and Tanaabe, I., J. Ceram. Soc. Jpn. 97, 1534 (1989)10.2109/jcersj.97.1534Google Scholar
6 Fitzgibbons, E.T., Sladek, K.J. and Hartwig, W.H., J. Electrochem. Soc. 119, 735 (1972).10.1149/1.2404316Google Scholar