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Lattice-Matching Growth of InGaAIN Systems

Published online by Cambridge University Press:  21 February 2011

Takashi Matsuoka
Takashi Matsuoka*
Affiliation:
NTT Opto-electronics Labs., 3-1 Morinosato Wakamiya, Atsugi-shi, Kanagawa, 243-01 Japan, matsuoka@aecl.ntt.jp
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Abstract

The development and device applications of the InGaAIN system have progressed dramatically with improvements in crystalline quality by achieved through a buffer layer, the realization of p-type doping, and the growth of ternary alloys. As a substrate, sapphire is mainly used for epitaxial growth because of the lack of a GaN bulk crystal. However, many cracks in GaN film can still be observed and its X-ray rocking curve width is less than 100 arc seconds. This is are thought to be due to the lattice constants and thermal expansion coefficients of GaN and sapphire differ by 13.8% and by -34.2%, respectively. These values are extremely large in comparison with the corresponding values for InP and GaAs. Lattice-matching growth thus remains a basic problem in growing the high-quality epitaxial films necessary for high-performance devices.

This paper reviews attempts at lattice-matching growth. Lattice-matching growth of InGaN on a house-made ZnO substrate and near-lattice-matching growth of GaN on SiC and NdGaO3 substrates have been proposed and performed, and the effects of lattice-matching have been confirmed. Various types of surface planes commercially available sapphire substrates are also discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 395: Symposium AAA – Gallium Nitride and Related Materials: The First International Symp , 1995 , 39
Copyright
Copyright © Materials Research Society 1996

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References

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