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Kinetics of Facet Formation During Growth and Etching of Crystals

Published online by Cambridge University Press:  21 February 2011

D. G. Vlachos ,
L. D. Schmidt  and
R. Aris
D. G. Vlachos
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455
L. D. Schmidt
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455
R. Aris
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, MN 55455
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Abstract

Morphological instabilities of surfaces with respect to faceting in deposition of microelectronic materials and etching of semiconductors and catalysts are of great technological importance. Macroscopic theories fail in predicting correctly the time and size dependence of microstructures observed.

We have examined the temporal and spatial evolution of unstable interfaces in zero net flux, growth, and etching of crystals as functions of temperature and degree of irreversibility using the Monte Carlo method. In addition to faceting, thermal or kinetic roughening transitions are also observed under some conditions. We have found that the type of transition and the surface structures depend strongly on the irreversibility of the process and the surface temperature. It is demonstrated that surface diffusion has a profound influence on the transitions and surface morphologies.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 237: Symposium Ca – Interface Dynamics and Growth , 1991 , 145
Copyright
Copyright © Materials Research Society 1992

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References

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