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Ion-Implanted Superionic Clusters

Published online by Cambridge University Press:  21 February 2011

Yiping Feng ,
Paul W. Wang  and
Walter L. Roth
Yiping Feng
Affiliation:
State University of New York at Albany, Physics Department. 1400 Washington Avenue, Albany, New York 12222
Paul W. Wang
Affiliation:
State University of New York at Albany, Physics Department. 1400 Washington Avenue, Albany, New York 12222
Walter L. Roth
Affiliation:
State University of New York at Albany, Physics Department. 1400 Washington Avenue, Albany, New York 12222
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Abstract

Ag+ was implanted in silica glass and beta alumina crystal and studied using particle backscattering and optical absorption. We found that Ag aggregates into colloidal metallic particles and when annealed diffuses toward the surface. The activation energy for diffusion is 0.14 eV in silica glass and 0.16 eV in beta alumina. Computer simulations indicate fast Ag+ diffusion is due to large concentrations of vacancies deposited along the track of the implanted ion. The high ionic conductivity of beta alumina promotes uniform spreading of the implanted layer.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 135: Symposium M – Solid State Ionics I , 1988 , 535
Copyright
Copyright © Materials Research Society 1989

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References

1. Hirvonen, J.K., “Ion Implantation”, Treatise on Materials Science and Technology, Vol. 18, New York (1980)Google Scholar
2. Warren, B.E. and Biscoe, J., J. Amer. Ceramic Soc., 21, 259 (1938)CrossRefGoogle Scholar
3. Roth, W.L., J. Solid State Chem., 4, 60 (1972)Google Scholar
4. Whittingham, M.S. and Huggins, R.A., J. Electrochem. Soc., 118 1 (1971)Google Scholar
5. Ziegler, J.F., Biersack, J.P., and Littmark, V., The Stogging and Range of Ions in Matter Pergamon Press, New York (1985)Google Scholar
6. Arnold, G.W. and Borders, J. A., Inst. Phys. Conf. Ser. No. 28 (1976) Chapter 3Google Scholar
7. Treilleux, M., Thevenard, P., Chassagne, G. and Guermazi, M., Surface Science, 106, 165 (1981)Google Scholar
8. Mie, G. Ann. Physik (Leipzig) 25 377 (1908)Google Scholar
9. Dovle, W.. Phys. Rev. 111, 1067 (1958)Google Scholar
10. Arnold, G.W. and Borders, J.A., J. of Appl. Physics, 48, 1488 (1976)Google Scholar