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The Influence of Temperature Gradients on Partial Pressures in a Cvd Reactor

Published online by Cambridge University Press:  22 February 2011

T.G.M. Oosterlaken
Affiliation:
DIMES/ Section Submicron Technology, Delft University of Technology, P.O. Box 5046, 2600 GA Delft, The Netherlands
G.J. Leusink
Affiliation:
DIMES/ Section Submicron Technology, Delft University of Technology, P.O. Box 5046, 2600 GA Delft, The Netherlands
G.C.A.M. Janssen
Affiliation:
DIMES/ Section Submicron Technology, Delft University of Technology, P.O. Box 5046, 2600 GA Delft, The Netherlands
S. Radelaar
Affiliation:
DIMES/ Section Submicron Technology, Delft University of Technology, P.O. Box 5046, 2600 GA Delft, The Netherlands
K.J. Kuijlaars
Affiliation:
Kramers Laboratorium voor Fysische Technologie, Delft University of Technology, Prins Bernhardlaan 6, 2628 BW Delft, The Netherlands
C.R. Kleijn
Affiliation:
Kramers Laboratorium voor Fysische Technologie, Delft University of Technology, Prins Bernhardlaan 6, 2628 BW Delft, The Netherlands
H.E.A. Van Den Akker
Affiliation:
Kramers Laboratorium voor Fysische Technologie, Delft University of Technology, Prins Bernhardlaan 6, 2628 BW Delft, The Netherlands
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Abstract

The influence of temperature gradients on the partial pressures of a binary mixture in a cold wall low pressure chemical vapor deposition reactor was determined by Raman spectroscopy of the gaseous species in the reactor. It is demonstrated for the first time that the partial pressure of the heavy constituent in the hot region of a low pressure reactor is reduced by 35 % due to the Soret effect. Model calculations that included the Soret effect are in agreement with the experimental data.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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