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In Situ Observation of Instability in Step Morphology during Epitaxy and Erosion

Published online by Cambridge University Press:  17 March 2011

P. Finnie  and
Y. Homma
P. Finnie
Affiliation:
New affiliation: Institute for Microstructural Sciences, National Research Council Canada Montreal Road, Ottawa, ON, Canada K1A OR6
Y. Homma
Affiliation:
NTT Basic Research Laboratories, 3-1 Morinosato-Wakamiya, Atsugi-Shi, Kanagawa 243-0198, Japan
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Abstract

Instability in the morphology of atomic steps is predicted for certain growth conditions [1]. To test and extend this prediction, various atomic step geometries were prepared on ultra-flat Si(111) substrates. Atomic steps were observed using an in situ scanning electron microscope. For specific growth conditions and certain step arrangements, unstable growth was observed. The stability of step flow growth depends, in part, on the flux arriving at the surface. In contrast to the theoretical prediction, in this more general situation, the same type of instability can also be observed in sublimation. For both growth and sublimation, the terrace widths adjacent to a step determine whether that step will undergo stable or unstable step flow. The mechanism by which the step spacing controls the morphology is described. Although only the Si(111) surface was observed, it is predicted that the same step instability should be present on many surfaces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 648: Symposium P – Growth, Evolution & Properties of Surfaces, Thin Films, and Self Organized Structure , 2000 , P10.12
Copyright
Copyright © Materials Research Society 2001

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