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Importance of Filament Reactivity for CVD Diamond Growth

Published online by Cambridge University Press:  26 February 2011

M. Sommer
Affiliation:
Department of Physics, City College of New York, Convent Ave. & 138th St., New York, NY 10031
F. W. Smith
Affiliation:
Department of Physics, City College of New York, Convent Ave. & 138th St., New York, NY 10031
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Abstract

The behavior of tungsten filaments heated up to 2500°C in mixtures of CH4 or C2 H2 and H2 at P = 9 and 25 Torr is analyzed. It has been found that the filament resistance R, spectral emissivity ?, power consumption, and CH4 and C2H2 partial pressures depend critically onl the filament temperature as well as the reactant CH4/ H2 or C2H2/ H2 fraction. We interpret these results on the basis of a thermodynamic model which predicts that transitions between deposition and etching of solid carbon occur on the filament surface at high temperatures. The implications of these results for diamond CVD are discussed. Evidence for gas phase reactions is also presen ted.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

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