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Hollow Cold Cathode Ion Source for Reactive Ion-Beam Etching
Published online by Cambridge University Press: 21 February 2011
Abstract
A wide-aperture reactive gas ion source has been developed for various ion-beam processings in high vacuum (p < < 5×10−2 Pa). The peculiar feature of the ion source is that two-stage self-maintained low-pressure discharge is used here as a plasma emitter. This provides high operating parameters of the source along with simple diode-type structure.
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- Research Article
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- Copyright © Materials Research Society 1990
References
REFERENCES
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Stognij, A.I., Tokarev, V.V. ( to be published in “Pribory, tekhnika, experiment”, 1990).Google Scholar