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High Power Broad Area GaInAs/GaAs/GaInP Lasers Grown by CBE for Pumping Er Doped Glasses

Published online by Cambridge University Press:  22 February 2011

Ph. Maurel
Affiliation:
THOMSON-CSF/LCR, Domaine de Corbeville, 91404 Orsay Cedex, France
J.C. Garcia
Affiliation:
THOMSON-CSF/LCR, Domaine de Corbeville, 91404 Orsay Cedex, France
J.P. Hirtz
Affiliation:
THOMSON-CSF/LCR, Domaine de Corbeville, 91404 Orsay Cedex, France
E. Vassilakis
Affiliation:
THOMSON-CSF/TCS, BP 46, 91401 Orsay Cedex, France
M. Baldy
Affiliation:
THOMSON-CSF/LCR, Domaine de Corbeville, 91404 Orsay Cedex, France
A. Parent
Affiliation:
THOMSON-CSF/TCS, BP 46, 91401 Orsay Cedex, France
C. Carriere
Affiliation:
THOMSON-CSF/TCS, BP 46, 91401 Orsay Cedex, France
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Abstract

GaInAs/GaAs/GaInP multiquantum well laser structures have been grown by chemical beam epitaxy (CBE) using conventional sources (hydrides as group V element sources). Large area lasers were photolitographically defined and mounted for continuous wave (CW) measurements. CW output power levels of 600 mW at 25°C are reported from 100 μm wide, 300 μm long laser diodes without any facet treatment. At these levels, the delivered current is 2A, with an associated voltage of less than 1.7 V. The characteristic temperature of the structure is 95 K.

The same structures were then grown using tertiarybutylarsine (TBAs) and tertiarybutylphosphine (TBP). The large area laser diodes were characterized under pulsed conditions. For a 300 μm long cavity, threshold current density of 390 A/cm2 and external quantum efficiency of 0.6 W/A (2 facets) were obtained, demonstrating the suitability of TBP and TBAs as substitutes of arsine and phosphine in chemical beam epitaxy for laser fabrication.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

[1] Laporta, P., Taccheo, S., Svelto, O., Electron. Lett., 28, 490 (1992).Google Scholar
[2] Wang, C.A., Choi, H.K., IEEE J. Quantum Elec., 27, 681 (1991).Google Scholar
[3] Fukagai, K., Ishikawa, S., Endo, K., Yuasa, T., Jpn. J. Appl. Phys., 30, L371 (1991)Google Scholar
[4] Tang, W.C., Rosen, H.J., Vettiger, P., Webb, D.J., Appl. Phys. Lett., 59, 1005 (1991).Google Scholar
[5] Zhang, G., Nappi, J., Vanttinen, K., Asonen, H., Pessa, M., Appl. Phys. Lett., 61, 96 (1992).Google Scholar
[6] Liau, Z.L., Palmateer, S.C., Groves, S.H., Walpole, J.N., Missaglia, L.J., Appl. Phys. Lett., 60, 6 (1992).Google Scholar
[7] Tsang, W.T., Kapre, R., Wu, M.C., Chen, Y.K., Appl. Phys. Lett., 61, 755 (1992).Google Scholar
[8] Mobarhan, K., Razeghi, M., Marquebielle, G., Vassilakis, E., J. Appl. Phys., 72, 4447, (1992).Google Scholar
[9] Ogasawara, M., Sato, K., Kondo, Y., Appl. Phys. Lett., 60, 1217 (1992).Google Scholar
[10] Kim, T.S., Bayraktaroglu, B., Henderson, T.S., Plumton, D.L., Appl. Phys. Lett., 58, 1997 (1991).Google Scholar
[11] Ougazzaden, A., Mellet, R., Gao, Y., Kazmierski, K., Rhein, C., Mircea, A., Electron. Lett., 27, 1005 (1991).Google Scholar
[12] Ritter, D., Panish, M.B., Hamm, R.A., Gershoni, G., Brener, I., Appl.Phys.Lett., 56, 1448 (1990).Google Scholar
[13] Hincelin, G., Zahouh, M., Mellet, R., Pougnet, A.M., J. Crystal Growth,, 120, 119 (1992).Google Scholar
[14] Yamada, N., Roos, G., Harris, J.S., Appl. Phys. Lett., 59, 1040 (1991).Google Scholar
[15] Ph. Maurel, Nagle, J., Hirtz, J.P. to be published in Jpn. J. Appl. Phys. (march 1993)Google Scholar
[16] Garcia, J.C., Regreny, Ph., Delage, S., Blanck, H., Hirtz, J.P., Proceeding of the 7th international MBE conference, Stuttgart (1992), to be published in J. Crystal Growth (1993)Google Scholar
[17] Kothiyal, G.P., Bhattacharya, P., J. Appl. Phys., 63, 2760 (1988).Google Scholar
[18] Chen, T.R., Zhao, B., Zhuang, Y.H., Yariv, A., Ungar, J.E., Oh, S., Appl. Phys. Lett., 60, 1782 (1992).Google Scholar
[19] Maurel, Ph., Garcia, J.C., Regreny, Ph., Hirtz, J.P., Vassilakis, E., Parent, A., Baldy, M., Carrire, C., Electron. Lett., 29, 91 (1993).Google Scholar
[20] Garcia, J.C., Maurel, Ph., Hirtz, J.P., Electron. Lett., 29, 432 (1993).Google Scholar