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High Doped p-Type GaN Grown by Alternative Co-Doping Technique
Published online by Cambridge University Press: 01 February 2011
Abstract
We investigated the electrical properties of Mg-doped GaN grown by alternative pulse supplies of source and dopant materials in metalorganic vapor phase epitaxy. We obtained the hole concentration of 6×1018cm-3 for p-type GaN grown on a sapphire substrate by repetition of supply and purging of Ga and Mg sources in the constant NH3 flow, while that of p-type GaN grown by the constant feeding of Ga and Mg sources was 2×1018cm-3. By using alternative feedings of Ga source and NH3 with Mg-Si co-doping, we obtained a highly hole concentration of 2×1019cm-3 for p-type GaN which was grown directly on a low temperature AlN buffer layer. We also obtained the hole concentration of 6×1018cm-3 for p-type GaN which was grown on an AlGaN layer on a SiC substrate by alternative co-doping technique. The activation energies for Mg-doped GaN grown by the pulse feedings of source materials were lower than that for GaN grown by continuous supplies of source materials as used in the conventional technique.
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