Hostname: page-component-7bb8b95d7b-pwrkn Total loading time: 0 Render date: 2024-09-25T21:05:45.806Z Has data issue: false hasContentIssue false
  • English
  • Français

Growth of TiN/AlN Superlattice by Pulsed Laser Deposition

Published online by Cambridge University Press:  11 February 2011

H. Wang ,
A. Gupta ,
Ashutosh Tiwari ,
X. Zhang  and
J. Narayan
H. Wang
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695–7916
A. Gupta
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695–7916
Ashutosh Tiwari
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695–7916
X. Zhang
Affiliation:
Materials Science & Technology Division, Los Alamos National Laboratory, Los Alamos, NM 87544
J. Narayan
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695–7916
Get access

Abstract

TiN-AlN binary-components have attracted a lot of interests in coatings of high speed cutting tools, due to their higher oxidation resistance, higher hardness, lower internal stresses and better adhesion. Especially, nanometer-scale multilayer structures of AlN/TiN show superior structural and mechanical properties due to their tremendous interface area and become one of the promising candidates for superhard coatings. Here we present a novel method to grow highly aligned TiN/AlN superlattice by pulsed laser deposition. In this method TiN and AlN targets are arranged in a special configuration that they can be ablated in sequence, giving alternate layer by layer growth of TiN(1nm)/AlN(4nm). X-ray diffraction and transmission electron microscopy (TEM) analysis showed the structure to be cubic for both TiN and AlN in the nanoscale multilayers. Microstructure and uniformity for the superlattice structure were studied by TEM and Scanning transmission electron microscopy with Z-contrast (STEM). Nanoindentation results indicated a higher hardness for this new structure than pure AlN and rule-of-mixtures value. Four point probe electrical resistivity measurements showed overall insulating behavior.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 750: Symposium Y – Surface Engineering 2002–Synthesis, Characterization and Applications , 2002 , Y5.4
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERECES

1. Hultman, L., Vacuum, 57, 1(2000).Google Scholar
2. Koing, W., Fritsch, R., Kammermeier, D.,, Surf. Coat. Technol., 49, 316(1991).Google Scholar
3. Ikeda, S., Gilles, S., and chenevierf, B., Thin Solid Films, 315, 257(1998).Google Scholar
4. Leylendecker, T., Lemmer, O., Esser, S., and Ebberink, J., Surf. Coat. Technol. 48, 175(1991).Google Scholar
5. Tanaka, Y., J. Vac. Sci. Technol. A 10, 1749(1992).Google Scholar
6. Ikeda, T., and Satoh, H., Thin Solid Films 195, 99(1991).Google Scholar
7. Knotek, O., Elsing, E., Atzor, M., and Prengel, H. G., Wear, 133, 189(1989).Google Scholar
8. Clemens, B. M., Kung, H., and Barnett, S. A., Mater. Res. Soc. Bull. February, 20 (1999).Google Scholar
9. Shinn, M., and Barnett, S. A., Appl. Phys. Lett., 64, 61(1994).Google Scholar
10. Madan, A., Kim, I. W., Cheng, S. C., Ashar, P. Y., Dravid, V. P., and Barnett, S. A., Phys. Rev. Lett., 78, 1743(1997).Google Scholar
11. Godbole, V. P., Dovidenko, K., Sharma, A. K., and Narayan, J., Mater. Sci. Eng. B, 68, 85(1999).Google Scholar
12. Procopio, A.T., El-Raghy, T., and Barsoum, M. W., Metal. Mater. Trans. A., 31A, 373(2000).Google Scholar
13. Narayan, J., Tiwari, P., Chen, X., Singh, J., Chowdhury, R. and Zheleva, T., Appl. Phys. Lett. 61, 1290(1992). (J Narayan, U.S. Patent#5, 406,123, April 11, 1995)Google Scholar