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Growth of BaTiO3 Thin Films by MOCVD

Published online by Cambridge University Press:  15 February 2011

Debra L. Kaiser ,
Mark D. Vaudin ,
Greg Gillen ,
Cheol-Seong Hwang ,
Lawrence H. Robins  and
Lawrence D. Roiter
Debra L. Kaiser
Affiliation:
Ceramics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899
Mark D. Vaudin
Affiliation:
Ceramics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899
Greg Gillen
Affiliation:
Surface and Microanalysis Science Division, National Institute of Standards and Technology, Gaithersburg, MD 20899
Cheol-Seong Hwang
Affiliation:
Ceramics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899
Lawrence H. Robins
Affiliation:
Ceramics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899
Lawrence D. Roiter
Affiliation:
Ceramics Division, National Institute of Standards and Technology, Gaithersburg, MD 20899
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Abstract

Polycrystalline thin films of BaTiO3 were deposited on fused quartz substrates at 600°C by metalorganic chemical vapor deposition (MOCVD). The films were characterized by x-ray powder diffraction (XRD), transmission electron microscopy (TEM), secondary ion mass spectroscopy (SIMS) and Raman spectroscopy. Films prepared in the early stages of this study that had appeared to contain only crystalline BaTiO3 by XRD were found to have nonuniform composition and microstructure through the film thickness by SIMS and TEM. The MOCVD system was then modified by installing a process gas bypass apparatus and an elevated pressure bubbler for the titanium isopropoxide precursor. A 1.2 μm thick BaTiO3 film prepared in the modified system demonstrated much improved compositional and microstructural uniformity through the thickness of the film. This film had a columnar microstructure with grain widths of 0.1–0.2 μm and exhibited tetragonality as detected by Raman spectroscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 335: Symposium Y – Metal-Organic Chemical Vapor Deposition of Electronic Ceramics , 1993 , 47
Copyright
Copyright © Materials Research Society 1994

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