Hostname: page-component-77c89778f8-rkxrd Total loading time: 0 Render date: 2024-07-18T11:50:36.019Z Has data issue: false hasContentIssue false

Growth Kinetics and Structure of Ultrathin Copper Films on the W(110) Surface Studied by Leem

Published online by Cambridge University Press:  21 February 2011

M.S. Altman
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
E.Z. Luo
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
W.F. Chung
Affiliation:
Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
B.G. Orr
Affiliation:
Department of Physics, University of Michigan, Ann Arbor, Michigan, U.S.A.
Get access

Abstract

Competing desorption during the epitaxial growth of Cu on the W(110) surface has been studied with low energy electron microscopy (LEEM). Direct imaging of a structural transformation from pseudomorphic (1×1) to relaxed (15×1) periodicity which occurs at a coverage of θCu = 2.13 monolayers is used as a very accurate, local probe of coverage during deposition. The desorption energy E = 3.67 eV and attempt frequency v = 2.15 × 1015 s−1 are determined by examining the balance condition when the incident and desorption fluxes are equal. A step-flow-like growth morphology occurs when the supersaturation is significantly reduced by competing desorption. An island nucleation and coalescence growth morphology results at higher supersaturation.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Burton, W.K., Cabrera, N., and Frank, F.C., Philos. Trans. R. Soc. London Ser. A 243, 299 (1951)Google Scholar
2 Taylor, N., Surf. Sci. 4, 161 (1966).Google Scholar
3 Bauer, E., Poppa, H., Todd, G., Bonczek, F., J. Appl. Phys. 45, 5164 (1974).Google Scholar
4 Bauer, E., Appl. Surf. Sci. 11/12, 479 (1982).Google Scholar
5 Lilienkamp, G., Kozioł, C., Bauer, E., Sur. Sci. 226, 358 (1990).Google Scholar
6 Bauer, E. and van der Merwe, Jan H., Phys. Rev. B 33, 3657 (1986).Google Scholar
7 Luo, E.Z., Altman, M.S., Cai, Q., Chung, W.F. and Orr, B.G. (to be published).Google Scholar
8 Bauer, E., Rept. Prog. Phys. 57, 895 (1994).Google Scholar
9 Altman, M.S. and Chung, W.F., Proceedings of the 13th International Congress on Electron Microscopy, Paris (1994) pp. 1025–6.Google Scholar
10 Tu, K.N., Mayer, J.W. and Feldman, L.C., Electronic Thin Film Science for Electrical Engineers and Materials Scientists, (Macmillan Publishing Co., New York, 1992).Google Scholar