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Growth And Structure Of Nanometric Iron Oxide Films

Published online by Cambridge University Press:  10 February 2011

E. Guiot ,
S. Gota ,
M. Henriot ,
M. Gautier-Soyer  and
S. Lefebvre
E. Guiot
Affiliation:
DSM / DRECAM / SRSIM - CEA SACLAY - 91191 - Gif sur Yvette Cedex - France
S. Gota
Affiliation:
DSM / DRECAM / SRSIM - CEA SACLAY - 91191 - Gif sur Yvette Cedex - France
M. Henriot
Affiliation:
DSM / DRECAM / SRSIM - CEA SACLAY - 91191 - Gif sur Yvette Cedex - France
M. Gautier-Soyer
Affiliation:
DSM / DRECAM / SRSIM - CEA SACLAY - 91191 - Gif sur Yvette Cedex - France
S. Lefebvre
Affiliation:
LURE, Batiment 209 D, Centre Universitaire Paris Sud - 91405 - Orsay cedex - France.
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Abstract

Nanometric films of iron oxides (Fe3O4, α and γ Fe2O3) of high crystalline order and purity are epitaxially grown on α-A12O3(0001) by atomic oxygen assisted MBE. A complete characterization of the films structure has been performed by in situ LEED and RHEED, and ex situ GIXRD using synchrotron radiation. The films grown at room temperature and post annealed at 400°C and 700°C (po2=10−6 Torr) are respectively metastable γ-Fe2O3 (111) and α-Fe2O3 (0001). For a substrate temperature of 450°C during growth, Fe3O4 (111) is directly obtained. GIXRD shows an in-plane expansion of the films, which decreases with thickness (0.8 and 0.2% for film thickness of 20 and 80 Å, respectively).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 524: Symposium V – Application of Synchrotron Radiation Techniques…IV , 1998 , 101
Copyright
Copyright © Materials Research Society 1998

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References

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