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Growth and Characterization of Hard Nitrides Films Prepared by Pulsed Laser Deposition

Published online by Cambridge University Press:  15 February 2011

R. B. Inturi
Affiliation:
Department of Metallurgical and Materials Engineering, The University of Alabama, Tuscaloosa, AL 35487-0202
Ashok Kumar
Affiliation:
Department of Electrical Engineering, University of South Alabama, Mobile, AL 36688
U. Ekanayake
Affiliation:
Department of Electrical Engineering, University of South Alabama, Mobile, AL 36688
N. Shu
Affiliation:
Department of Electrical Engineering, University of South Alabama, Mobile, AL 36688
J. A. Barnard
Affiliation:
Department of Metallurgical and Materials Engineering, The University of Alabama, Tuscaloosa, AL 35487-0202
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Abstract

Transition metal of nitrides have many desirable properties for application at elevated temperatures because of extremely high melting point, hardness, high temperature strength, good thermal shock resistance, and high thermal conductivity. We have investigated the thin film coatings of nitrides (titanium nitride, and composite carbon nitride) on various commercial useful substrates by the pulsed laser deposition (PLD) method. The PLD method is unique process for depositing high quality thin films with novel microstructure and properties. The laser parameters: energy density, pulse rate, target/substrate distance and substrate temperature have been optimized to improve the quality of thin films. The mechanical properties of the films have been evaluated at different processed conditions by nanoindentation technique. The films were characterized by X-ray diffraction, scanning electron microscope and FTIR techniques. Optimization of laser deposition parameters to obtain high quality thin films will be discussed in detail.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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