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Gold-Nickel Multilayer Films: Structure-Property Correlations

Published online by Cambridge University Press:  22 February 2011

S. R. Nutt ,
K A. Green ,
S. P. Baker ,
W. D. Nix  and
A. Jankowski
S. R. Nutt
Affiliation:
Brown University, Box D, Providence, RI 02912
K A. Green
Affiliation:
Brown University, Box D, Providence, RI 02912
S. P. Baker
Affiliation:
Department of Materials Science and Engineering, Bldg. 550, Stanford University, Stanford, CA 94305
W. D. Nix
Affiliation:
Department of Materials Science and Engineering, Bldg. 550, Stanford University, Stanford, CA 94305
A. Jankowski
Affiliation:
Lawrence Livermore National Lab, P.O. Box 808, L-350, Livermore, CA 94550
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Abstract

Gold-nickel multilayer films with periods of 1.2 - 4.6 nm were deposited on silicon substrates by magnetron sputtering, and plan and cross-sectional specimens were examined by transmission electron microscopy. The cross-sectional specimens revealed well-defined layering and columnar growth features that extended through the film thickness. Dark striations extending normal to the layers were attributed to diffraction contrast from defect strain fields. Diffraction patterns showed that the films were highly textured and that short-period films had a single fcc structure, while long-period films separated into three fcc structures. High-resolution images of the layer interfaces showed local regions of epitaxy partitioned by regions of disorder.

Indentation tests using a Nanoindenter, a depth-sensing indentation device, were performed to measure the elastic modulus and hardness of the films. No modulus enhancement was detected, and a small variation in hardness was measured.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 130: Symposium C – Thin Films: Stresses and Mechanical Properties I , 1988 , 129
Copyright
Copyright © Materials Research Society 1989

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