Hostname: page-component-77c89778f8-m8s7h Total loading time: 0 Render date: 2024-07-25T01:58:34.288Z Has data issue: false hasContentIssue false

Gallium Arsenide Layers Grown By Mbe on Germanium Islands on Insulator

Published online by Cambridge University Press:  28 February 2011

M. Takai
Affiliation:
Faculty of Engineering Science, Osaka University, Toyonaka, Osaka, Japan
Y. Kodama
Affiliation:
Faculty of Engineering Science, Osaka University, Toyonaka, Osaka, Japan
T. Tanigawa
Affiliation:
Faculty of Engineering Science, Osaka University, Toyonaka, Osaka, Japan
K. Kobayashi
Affiliation:
Faculty of Engineering Science, Osaka University, Toyonaka, Osaka, Japan
K. Gamo
Affiliation:
Faculty of Engineering Science, Osaka University, Toyonaka, Osaka, Japan
S. Namba
Affiliation:
Faculty of Engineering Science, Osaka University, Toyonaka, Osaka, Japan
Get access

Abstract

Local variation of photoluminescence (PL) spectra for MBE GaAs grown on an insulating substrate with Ge-islands interface layers, prepared by zone melting recrystallization, has been investigated. The GaAs layers on the single crystalline Ge islands emit PL, the intensity of which was almost comparable to that of the GaAs layers on bulk Ge, while by a factor of 50 lower PL intensity was observed for the GaAs layers on Si02. PL spectra were found to show peak shifts due to the band-gap variation near the interface layer of GaAs, which was in good agreement with the residual strain obtained by microprobe Raman scattering for underlying Ge islands.

Type
Research Article
Copyright
Copyright © Materials Research Society 1986

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.See for example, Mat. Res. Soc. Symp. Proc. 23 (1984)Google Scholar
2.Takai, M., Tanigawa, T., Gamo, K., and Namba, S., Japan. J. Appl. Phys. 22, L626 (1983)Google Scholar
3.Takai, M., Tanigawa, T., Minamisono, T., Gamo, K., and Namba, S., Japan. J. Appl. Phys. 23, L308 (1984)Google Scholar
4.Takai, M., Tanigawa, T., Gamo, K., and Namba, S., Japan. J. Appl. Phys. 23, L357 (1984)Google Scholar
5.Takai, M., Tanigawa, T., Miyauchi, M., Nakashima, S., Gamo, K., and Namba, S., Japan. J. Appl. Phys. 23, L363 (1984)Google Scholar
6.Takai, M., Tanigawa, T., Gamo, K., and Namba, S., Mat. Res. Soc. Symp. Proc. 23, 397 (1984)Google Scholar
7.Takai, M., Tanigawa, T., Miyauchi, M., Nakashima, S., Gamo, K., and Namba, S., Laser Processing and Diagnostics, ed. by Baeuerle, D. (Springer-Verlag, Berlin, 1984) p. 480Google Scholar
8.Tsaur, B.Y., McClelland, R.W., Fan, J.C.C., Gale, R.P., Salerno, J.P., Vojak, B.A. and Bozler, C.O., Appl. Phys. Lett. 41, 347 (1982)Google Scholar
9.Gale, R.P., land, R.W. McClel, Fan, J.C.C., and Bozler, C.O., Appl. Phys. Lett. 41, 545 (1982)Google Scholar
10.Shinoda, Y., Nishioka, T., and Ohmachi, Y., Japan. J. Appl. Phys. 22, L450 (1983)Google Scholar