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FTIR Studies of CH3OH on Porous Silicon

Published online by Cambridge University Press:  28 February 2011

John A. Glass Jr. ,
Edward A. Wovchko  and
John T. Yates Jr.
John A. Glass Jr.
Affiliation:
University of Pittsburgh, Surface Science Center, Department of Chemistry, Pittsburgh, PA, 15260.
Edward A. Wovchko
Affiliation:
University of Pittsburgh, Surface Science Center, Department of Chemistry, Pittsburgh, PA, 15260.
John T. Yates Jr.
Affiliation:
University of Pittsburgh, Surface Science Center, Department of Chemistry, Pittsburgh, PA, 15260.
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Abstract

Fourier transform infrared spectroscopy (FTIR) was used to investigate the reaction of methanol with porous silicon and hydrogen passivated porous silicon. At 300 K methanol adsorbs onto hydrogen free porous silicon by cleavage of the O-H bond. Both of the resulting surface species, Si-H and Si-OCH3, were determined to be stable up to ∼500 K. Above 500 K the Si-OCH3 moiety decomposes by breakage of the C-O and C-H bonds. The resulting carbon and oxygen were incorporated into the porous layer and additional Si-H surface species were detected. Further heating to 900 K removed the Si-H surface species. Adsorption of methanol onto hydrogen-passivated porous silicon did not occur until 600 K. At temperatures beyond 600 K, oxygen and carbon incorporation into the porous layer and Si-OCH3, Si-CH3, and Si-H surface species were seen. The previously unseen Si-CH3 surface species is believed to be stabilized by oxygen incorporation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 358: Symposium F – Microcrystalline and Nanocrystalline Semiconductors , 1994 , 399
Copyright
Copyright © Materials Research Society 1995

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References

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