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Formation, evolution and degradation of nanostructured covalent thin films deposited by Low Energy Cluster Beam Deposition

Published online by Cambridge University Press:  26 February 2011

Giuseppe Compagnini
Affiliation:
gcompagnini@unict.it, University of Catania, Dpt. of Chemistry, Viale A. Doria 6, Catania, N/A, 95125, Italy, +39 095 7385077, +39 095 580138
Luisa D'Urso
Affiliation:
ldurso@unict.it, Italy
A. Alessandro Scalisi
Affiliation:
University of Catania, Dpt. of Chemistry, Viale A. Doria 6, Catania, N/A, 95125, Italy, +39 095 7385077, +39 095 580138
Corinna Altamore
Affiliation:
University of Catania, Dpt. of Chemistry, Viale A. Doria 6, Catania, N/A, 95125, Italy, +39 095 7385077, +39 095 580138
Orazio Puglisi
Affiliation:
opuglisi@unict.it, Italy
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Abstract

Low Energy Cluster Beam Deposition (LECBD) is considered an intriguing technique to obtain thin layers with well defined structures at the nano- and meso-scale levels, allowing novel optical, electronic and magnetic properties. The produced layers are highly porous and extremely reactive due to the high surface to volume ratio and must be characterized with “in situ” techniques in order to study their original composition and their evolution once exposed to reactive gases. In this work we present a general overview and some results on the formation evolution and deposition of silicon and carbon cluster beams produced using a laser vaporization source.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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References

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