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Ferroelectric Film Synthesis, Past and Present: A Select Review

Published online by Cambridge University Press:  16 February 2011

R. A. Roy ,
K. F. Etzold  and
J. J. Cuomo
R. A. Roy
Affiliation:
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY 10598
K. F. Etzold
Affiliation:
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY 10598
J. J. Cuomo
Affiliation:
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY 10598
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Abstract

A review of the history of ferroelectric (FE) thin film synthesis is given covering the period of the 1960's to the present. Early methods, materials and applications are discussed. An assessment of the recent upsurge in activity takes note of current targeted applications, including nonvolatile memory, piezoelectric actuators, capacitors, and electro-optic devices. Focus is placed on similarities and differences in the most common film deposition processes. Comparison of microstructure and composition variation seen in films deposited by sputtering, laser ablation, and solution deposition is made. More detailed understanding of process-microstructure relations is stressed as necessary for film property control. Also discussed are the roles of substrate interactions and interface layers in thin film growth.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 200: Symposium Y – Ferroelectric Thin Films I , 1990 , 141
Copyright
Copyright © Materials Research Society 1990

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References

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