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Fabrication, Processing and Characterization of Thin Film ZnO for Integrated Optical Gas Sensors

Published online by Cambridge University Press:  31 January 2011

Eliana Kamińska
Affiliation:
eliana@ite.waw.pl, Institute of Electron Technology, Warsaw, Poland
Anna Piotrowska
Affiliation:
ania@ite.wa.pl, Institute of Electron Technology, Warsaw, Poland
Iwona Pasternak
Affiliation:
iwonap@ite.waw.pl, Institute of Electron Technology, Warsaw, Poland
Marek Ekielski
Affiliation:
ekielski@ite.waw.pl, Institute of Electron Technology, Warsaw, Poland
Krystyna Gołaszewska
Affiliation:
krystyg@ite.waw.pl, Institute of Electron Technology, Warsaw, Poland
Witold Rzodkiewicz
Affiliation:
rzodki@ite.waw.pl, Institute of Electron Technology, Warsaw, Poland
Tomasz Wojciechowski
Affiliation:
twojcie@ifpan.edu.pl, Institute of Physics, Polish Academy of Sciences, Warsaw, Poland
Elżbieta Dynowska
Affiliation:
dynow@ifpan.edu.pl, Institute of Physics, Polish Academy of Sciences, Warsaw, Poland
Przemysław Struk
Affiliation:
Przemyslaw.Struk@polsl.pl, Silesian Univeristy of Technology, Gliwice, Poland
Tadeusz Pustelny
Affiliation:
Tadeusz.Pustelny@polsl.pl, Silesian University of Technology, Gliwice, Poland
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Abstract

Zinc oxide layers deposited on quartz substrates by means of RF reactive magnetron sputtering with subsequent RTP annealing in a nitrogen flow at 400°C and in an oxygen flow at 500°C have been investigated in applications to waveguide structures. The ZnO films reveal a highly c-oriented columnar structure with a surface roughness of 4.3 nm. Annealing causes a significant increase of the lattice constant to the value of 5.210±0.001 Å suggesting the relaxation of the stress in the film. The annealing process causes a significant improvement of propagation properties of the fabricated waveguide structures in comparison to structures using as-deposited ZnO films. The minimal attenuation coefficient of the 630 nm thick films was found to be 2.8 and 3.0 dB/cm for TE0 and TM0 modes respectively.

Type
Research Article
Copyright
Copyright © Materials Research Society 2010

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