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Fabricating Two-Dimensional Metal Nanocrystal Arrays Using Pulsed-Laser Deposition and Focused Ion-Beam Technologies

Published online by Cambridge University Press:  17 March 2011

Richard F. Haglund Jr. ,
Robert A. Weller ,
Cynthia E. Heiner ,
Matthew D. McMahon ,
Robert H. Magruder III ,
Allen T. Newton ,
Liyong Shen  and
Leonard C. Feldman
Richard F. Haglund Jr.
Affiliation:
Departments of Physics and Astronomy, Electrical and Computer Engineering and Mechanical Engineering, Vanderbilt University, Nashville TN 37235, U.S.A.
Robert A. Weller
Affiliation:
Departments of Physics and Astronomy, Electrical and Computer Engineering and Mechanical Engineering, Vanderbilt University, Nashville TN 37235, U.S.A.
Cynthia E. Heiner
Affiliation:
Department of Physics, University of New Hampshire, Durham, NH 0382403568, U.S.A.
Matthew D. McMahon
Affiliation:
Department of Physics, Drew University, Madison, NJ 07940, U.S.A.
Robert H. Magruder III
Affiliation:
Departments of Physics and Astronomy, Electrical and Computer Engineering and Mechanical Engineering, Vanderbilt University, Nashville TN 37235, U.S.A.
Allen T. Newton
Affiliation:
Departments of Physics and Astronomy, Electrical and Computer Engineering and Mechanical Engineering, Vanderbilt University, Nashville TN 37235, U.S.A.
Liyong Shen
Affiliation:
Departments of Physics and Astronomy, Electrical and Computer Engineering and Mechanical Engineering, Vanderbilt University, Nashville TN 37235, U.S.A.
Leonard C. Feldman
Affiliation:
Departments of Physics and Astronomy, Electrical and Computer Engineering and Mechanical Engineering, Vanderbilt University, Nashville TN 37235, U.S.A.
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Abstract

We describe recent experiments in which we attempted the initial steps for fabricating twodimensional arrays of metal nanocrystals. We use a commercial pulsed-laser deposition system in concert with a focused ion beam to attempt control over both lateral and vertical dimensions at the nanometer length scale. In our experiments, regular arrays of holes typically 80 nm in diameter were drilled in Si substrates using the focused ion beam. Silver atoms were then deposited onto these substrates by pulsed laser evaporation from a metallic target in high vacuum. Under certain conditions of substrate temperature, laser pulse repetition rate, and fluence, small silver nanoclusters form preferentially around the structures previously etched in the silicon surfaces by the focused ion beam.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 636: Symposium D – Nonlithographic and Lithographic Methods of Nanofabrication-From Ultralarge Scale , 2000 , D5.6.1
Copyright
Copyright © Materials Research Society 2001

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