Article contents
Extended Damage Depth Determinations in AR- and H-Implanted Silica Glass
Published online by Cambridge University Press: 22 February 2011
Abstract
Damage depths for Ar-implanted fused silica have been examined by Rutherford backscattering (RBS) and elastic recoil detection (ERD) ion-beam analysis. H incursion (6 at. %) from ambient atmospheres to twice TRIM values was found for damage depths which intersected the surface. H implants were used to decorate Ar damage for deeper Ar implants. The incursion of H for high-fluence implants is important for optoelectronic applications.
- Type
- Research Article
- Information
- Copyright
- Copyright © Materials Research Society 1994
References
REFERENCES
- 3
- Cited by