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Evolution of the Surface Structure of CVD Tungsten During Annealing

Published online by Cambridge University Press:  15 February 2011

C. L. Briant
Affiliation:
Division of Engineering, Brown University, Providence, Rhode Island 02912
R. H. Wilson
Affiliation:
General Electric Company, Research and Development Center, Schenectady, New York 12301
L. Bigio
Affiliation:
General Electric Company, Research and Development Center, Schenectady, New York 12301
W. G. Morris
Affiliation:
General Electric Company, Research and Development Center, Schenectady, New York 12301
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Abstract

This paper reports a study in which a rough tungsten surface was prepared by chemical vapor deposition of tungsten on a tungsten ribbon. The samples were then heated to study the smoothing behavior of the rough surface. The results show that at 1600°C the surface becomes smooth after approximately five to ten hours. At 2400°C the surface becomes smooth within 15 minutes.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

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