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Enhancement of the Amorphous to Microcrystalline Phase Transition in Silicon Films Deposited by Sif4-H2-He Plasmas

Published online by Cambridge University Press:  09 August 2011

G. Cicalai
Affiliation:
Plasma Chemistry Research Center, MITER-CNR, cscpgc07@area.ba.cnr.it, Dipartimento di Chimica-Università di Bari, Via Orabona, 4 70126-Bani, Italy
M. Losurdo
Affiliation:
Plasma Chemistry Research Center, MITER-CNR, cscpgc07@area.ba.cnr.it, Dipartimento di Chimica-Università di Bari, Via Orabona, 4 70126-Bani, Italy
P. Capezzuto
Affiliation:
Plasma Chemistry Research Center, MITER-CNR, cscpgc07@area.ba.cnr.it, Dipartimento di Chimica-Università di Bari, Via Orabona, 4 70126-Bani, Italy
G. Bruno
Affiliation:
Plasma Chemistry Research Center, MITER-CNR, cscpgc07@area.ba.cnr.it, Dipartimento di Chimica-Università di Bari, Via Orabona, 4 70126-Bani, Italy
T. Ligonzo
Affiliation:
Dipartimento di Fisica-Università di Bari
L. Schiavulli
Affiliation:
Dipartimento di Fisica-Università di Bari
C. Minarini
Affiliation:
ENEA C.R. Portici Napoli
M. C. Rossi
Affiliation:
Dipartimento di Ingegneria Elettronica UniversitA di Roma3, Roma Italy
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Abstract

Hydrogenated microcrystalline silicon (μc-Si:H) thin films have been obtained by plasma decomposition of SiF4-H2-He mixtures at low temperature (120 °C). The size of crystalline grain and their volume fraction with respect to the amorphous phase have been found dependent on the r.f. power as evaluated by grazing incidence X-ray diffraction, microRaman and ellipsometry measurements. Chemical and electrical properties change according to the microcrystallinity. Pure and/or highly microcrystalline silicon has been obtained at temperature and r.f. power as low as 120 °C and 15 Watt.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

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References

1. Toyama, T., Matsui, T., Kurokawa, Y., Okamoto, H. and Hamakawa, Y., Appl. Phys. Lett. 69, 1261 (1996).Google Scholar
2. Cicala, G., Capezzuto, P., Bruno, G., Schiavulli, L., Pema, G. and Capozzi, V., J. Appl. Phys. 80, 6564 (1996).Google Scholar
3. Meier, J., Fluckiger, R., Keppner, H. and Shah, A., Appl. Phys. Lett. 65, 860 (1994).Google Scholar
4. Veprek, S., Heintze, M., Sarott, F.-A., Jurcik-Rajman, M. and Willmott, P., in Amorphous Silicon Technology, edited by Madan, A., Thompson, M. J., Taylor, P. C., LeComber, P. G. and Hamakawa, Y. (Mater. Res. Soc. Proc. 118, Pittsburgh, PA, 1988) pp. 317.Google Scholar
5. Matsuda, A., Thin Solid Films 332, xx (1998)Google Scholar
6. Tsai, C. C., Thompson, R., Doland, C., Ponce, F. A., Anderson, G. B., Wacker, B. in Amorphous Silicon Technology, edited by Madan, A., Thompson, M. J., Taylor, P. C., LeComber, P. G. and Hamakawa, Y. (Mater. Res. Soc. Proc. 118, Pittsburgh, PA, 1988) pp. 4954.Google Scholar
7. Otobe, M., Kimura, M. and Oda, S., Jpn. J. Appl. Phys. 33, 4442 (1994).Google Scholar
8. Cicala, G., Capezzuto, P. and Bruno, G., Thin Solid Films 332, 1 (1998).Google Scholar
9. Bruno, G., Capezzuto, P., Cicala, G., J. Appl. Phys. 69, 7256 (1991).Google Scholar
10. Klug, H. P., , L. E. in Alexander, X-ray Diffraction Procedures, (New York John Wiley & Sons, 1974).Google Scholar
11. Jellison, G. E., Chisholm, M. F., Gorbatkin, S. M., Appl. Phys. Lett. 62, 1493 (1993).Google Scholar
12. Baglay, B. G., Aspnes, D. E., Adams, A. C., Mogab, C. J., Appl. Phys. Lett. 38, 56 (1981).Google Scholar
13. Campbell, I. H., Fauchet, P. M., Solid State Commun. 58, 739 (1986).Google Scholar
14. Gonzalez-Hernandez, J., Azarbayejani, G. H., Tsu, R., Pollack, F. H., Appl. Phys. Lett. 47, 1350 (1985).Google Scholar
15. Richter, H., Wang, Z. P., Ley, L., Solid State Commun. 39, 625 (1981).Google Scholar
16. Messana, C., Angelis, B. A. De, Conte, G., Gramaccioni, C., J. Phys. D 14, L91–4 (1981) and refs. therein.Google Scholar
17. Bruno, G., Capezzuto, P. and Cramarossa, F., Thin Solid Films 106, 145 (1983).Google Scholar