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Electrostatic-Directed Deposition of Nanoparticles on a Field Generating Substrate

Published online by Cambridge University Press:  01 February 2011

De-Hao Tsai ,
Takumi Hawa ,
Hung-Chih Kan ,
Raymond J Phaneuf  and
Michael R Zachariah
De-Hao Tsai
Affiliation:
NIST, Process Measurements Division, 100 Bureau Dr., Stop 8360, Building 221, Room B358, Gaithersburg, MD, 20899, United States, 301-975-5235, 301-869-5924
Takumi Hawa
Affiliation:
takumi.hawa@nist.gov, University of Maryland, Department of Mechanical Engineering and Department of Chemistry and Biochemistry, College Park, MD, 20742, United States
Hung-Chih Kan
Affiliation:
nistjapan@yahoo.com, University of Maryland, Department of Material Science and Engineering, College Park, MD, 20742, United States
Raymond J Phaneuf
Affiliation:
phaneuf@lps.umd.edu, University of Maryland, Department of Material Science and Engineering, College Park, MD, 20742, United States
Michael R Zachariah
Affiliation:
mrz@umd.edu, University of Maryland, Department of Mechanical Engineering and Department of Chemistry and Biochemistry, College Park, MD, 20742, United States
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Abstract

In this paper we develop a Brownian dynamics model applied to position metal nanoparticles from the gas phase onto electrostatic-patterns generated by biasing P-N junction substrates. Brownian motion and fluid convection of nanoparticles, as well as the interactions between the charged nanoparticles and the patterned substrate, including electrostatic force, image force and van der Waals force, are accounted for in the simulation. Using both experiment and simulation we have investigated the effects of the particle size, electric field intensity, and the convective flow on coverage selectivity. Coverage selectivity is most sensitive to electric field, which is controlled by the applied reverse bias voltage across the p-n junction. A non-dimensional analysis of the competition between the electrostatic and diffusion force is found to provide a means to collapse a wide range of process operating conditions and an effective indicator or process performance.

Keywords

particulateelectrodepositionsimulation
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1059: Symposium KK – Nanoscale Pattern Formation , 2007 , 1059-KK12-03
Copyright
Copyright © Materials Research Society 2008

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References

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