Hostname: page-component-848d4c4894-8kt4b Total loading time: 0 Render date: 2024-07-01T17:58:28.874Z Has data issue: false hasContentIssue false

Electrical Transport of an AlGaN/GaN Two-Dimensional Electron Gas

Published online by Cambridge University Press:  03 September 2012

A. Saxler
Affiliation:
Air Force Research Laboratory, Materials and Manufacturing Directorate, AFRL/MLPO, Wright-Patterson AFB, Ohio 45433-7707
P. Debray
Affiliation:
Air Force Research Laboratory, Materials and Manufacturing Directorate, AFRL/MLPO, Wright-Patterson AFB, Ohio 45433-7707 Permanent address: Service de Physique de l'Etat Condensé, Centre d'Etudes de Saclay, F-91191 Gif-sur-Yvette Cedex, France
R. Perrin
Affiliation:
Air Force Research Laboratory, Materials and Manufacturing Directorate, AFRL/MLPO, Wright-Patterson AFB, Ohio 45433-7707
S. Elhamri
Affiliation:
Air Force Research Laboratory, Materials and Manufacturing Directorate, AFRL/MLPO, Wright-Patterson AFB, Ohio 45433-7707 Permanent address: Department of Physics, University of Dayton, Dayton, OH 45469
W. C. Mitchel
Affiliation:
Air Force Research Laboratory, Materials and Manufacturing Directorate, AFRL/MLPO, Wright-Patterson AFB, Ohio 45433-7707
C.R. Elsass
Affiliation:
College of Engineering, University of California, Santa Barbara, CA 93106
I.P. Smorchkova
Affiliation:
College of Engineering, University of California, Santa Barbara, CA 93106
B. Heying
Affiliation:
College of Engineering, University of California, Santa Barbara, CA 93106
E. Haus
Affiliation:
College of Engineering, University of California, Santa Barbara, CA 93106
P. Fini
Affiliation:
College of Engineering, University of California, Santa Barbara, CA 93106
J.P. Ibbetson
Affiliation:
College of Engineering, University of California, Santa Barbara, CA 93106
S. Keller
Affiliation:
College of Engineering, University of California, Santa Barbara, CA 93106
P.M. Petroff
Affiliation:
College of Engineering, University of California, Santa Barbara, CA 93106
S.P. DenBaars
Affiliation:
College of Engineering, University of California, Santa Barbara, CA 93106
U.K. Mishra
Affiliation:
College of Engineering, University of California, Santa Barbara, CA 93106
J.S. Speck
Affiliation:
College of Engineering, University of California, Santa Barbara, CA 93106
Get access

Abstract

An AlxGa1-xN/GaN two-dimensional electron gas structure with x = 0.13 deposited by molecular beam epitaxy on a GaN layer grown by organometallic vapor phase epitaxy on a sapphire substrate was characterized. Hall effect measurements gave a sheet electron concentration of 5.1×1012 cm-2 and a mobility of 1.9 × 104 cm2/Vs at 10 K. Mobility spectrum analysis showed single-carrier transport and negligible parallel conduction at low temperatures. The sheet carrier concentrations determined from Shubnikov-de Haas magnetoresistance oscillations were in good agreement with the Hall data. The electron effective mass was determined to be 0.215±0.006 m0 based on the temperature dependence of the amplitude of Shubnikov-de Haas oscillations. The quantum lifetime was about one-fifth of the transport lifetime of 2.3 × 10-12 s.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Aktas, O., Fan, Z. F., Mohammed, S. N., Botchkarev, A. E., and Morkoç, H., Appl. Phys. Lett. 69, 3872, (1996).Google Scholar
2 Mishra, U.K., Wu, Y.-F., Keller, B.P., Keller, S. and DenBaars, S.P., IEEE Trans. on Microwave Theory and Tech., 46, 756, (1998).Google Scholar
3 McCarthy, L., Kozodoy, P., Rodwell, M., DenBaars, S., and Mishra, U., Compound Semiconductor 4(8), 16 (1998).Google Scholar
4 Razeghi, M. and Rogalski, A., J. Appl. Phys. 79, 7433, (1996).Google Scholar
5 Nakamura, S., Seno, M., Nagahama, S., Iwasa, N., Yamada, T., Matsushita, T., Sugimoto, Y., and Kiyoku, H., Appl. Phys. Lett. 69, 4056, (1996).Google Scholar
6 Elhamri, S., Newrock, R. S., Mast, D. B., Ahoujja, M., Mitchel, W. C., Redwing, J. M., Tischler, M. A., and Flynn, J. S., Phys. Rev. B 57, 1374, (1998).Google Scholar
7 Wong, L. W., Cai, S. J., Li, R., Wang, K., Jiang, H. W., and Chen, M., Appl. Phys. Lett. 73, 1391, (1998).Google Scholar
8 Im, J. S., Moritz, A., Steuber, F., Härle, V., Scolz, F., and Hangleiter, A., Appl. Phys. Lett. 70, 631, (1997).Google Scholar
9 King, S. W., Ronning, C., Davis, R. F., Benjamin, M. C., and Nemanich, R. J., J. Appl. Phys. 84, 2086, (1998).Google Scholar
10 Elsass, C.R., Smorchkova, I.P., Heying, B., Haus, E., Fini, P., Maranowski, K., Ibbetson, J.P., Keller, S., Petroff, P.M., DenBaars, S.P., Mishra, U.K., and Speck, J.S., Appl. Phys. Lett. 74, 3528, (1999).Google Scholar
11 Kim, J. S., Seiler, D. G., and Tseng, W. F., J. Appl. Phys. 73, 8324, (1993).Google Scholar
12 Vurgaftman, I., Meyer, J. R., Hoffman, C. A., Redfern, D., Antoszewski, J., Faraone, L., and Lindemuth, J. R., J. Appl. Phys. 84, 4966, (1998).Google Scholar
13 Coleridge, P. T., Stoner, R., and Fletcher, R., Phys. Rev. B 39, 1120 (1989); A. Isihara and L. Smrcka, J. Phys. C 19, 6777, (1986).Google Scholar