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Effects of the Substrate Temperature on the Crystallization and Development of Texture of Mn-Zn Ferrite thin Films Deposited by Ion Beam Sputtering

Published online by Cambridge University Press:  15 February 2011

Hae Seok Cho ,
Sang Ki Ha ,
Min Hong Kim  and
Hyeong Joon Kim
Hae Seok Cho
Affiliation:
Dept. oflnorg. Mat. Eng., Seoul National University, Seoul 151–742, Korea.
Sang Ki Ha
Affiliation:
Dept. oflnorg. Mat. Eng., Seoul National University, Seoul 151–742, Korea.
Min Hong Kim
Affiliation:
Dept. oflnorg. Mat. Eng., Seoul National University, Seoul 151–742, Korea.
Hyeong Joon Kim
Affiliation:
Dept. oflnorg. Mat. Eng., Seoul National University, Seoul 151–742, Korea.
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Abstract

We investigated the effects of the substrate temperature (Ts) on the crystallization and the development of texture of Mn-Zn ferrite thin films on SiO2/Si (100) under ion bombardment during ion beam sputtering. As-deposited films showed ferrimagnetic properties in spite of their crystallographic structure of wustite. The crystallographic structure of as-deposited films changed from (111) wustite structure to (222) spinel structure as oxygen partial pressure increased. The (222) preferred orientation seems to originate from oxygen-deficit ambient and preferential resputtering of oxygen ions in films during sputtering. The interplanar distance of the films deposited without oxygen flow decreased with increasing Ts due to release of compressive stress. The saturation Magnetization (Ms) of the film had maximum value at about 275°C, while the resistivity was almost of the same value irrespective of Ts. The unusual fact that crystallization and preferred orientation were less progressed at higher Ts was discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 317: Symposium B – Mechanisms of Thin Film Evolution , 1993 , 541
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

1. Matsuoka, M., Matsuda, Y., Hoshi, Y. and Naoe, M., J. Magn. Magn. Mater. 54–57, 1603 (1986).CrossRefGoogle Scholar
2. Matsumoto, K., Nakagawa, S. and Naoe, M., in Ferrites, edited by Watanabe, H., Iida, S., Sugimoto, M. (Proceedings ICF-3, India, 1989) pp. 545–549.Google Scholar
3. Okuno, S.N., Hashimoto, S., and Inomata, K., J. Appl. Phys. 71, 5926 (1992);CrossRefGoogle Scholar
in Ferrites, edited by Yamaguchi, T. and Abe, M. (Proceedings ICF-6, Tokyo, 1992) pp. 417–420.Google Scholar
4. Weissmantel, C., Thin Solid Films 32, 11 (1976).CrossRefGoogle Scholar
5. Harper, J.M.E., Cuomo, J.J., Gambino, R.J., and Kaufman, H.R., in Ion Bombardment Modification of Surfaces: Fundamentals and applications, edited by Auciello, O. and Kelly, R. (Elsevier, Amsterdam, 1984), p. 127, and references therein.Google Scholar
6. Bozorth, R.M., Tilden, E.F. and Sharman, A.J., J. Electochem. Soc. 113, 86 (1966).Google Scholar
7. Sosman, R.B., The Properties of Silica (Reinhold. New York, 1927), p. 362.Google Scholar
8. Wells, A.F., Structural Inorganic Chemistry. 5th ed. (Clarendon Press, Oxford, 1984), p. 552.Google Scholar
9. Slick, P.I., in Ferromagnetic Materials. Vol. 2, edited by Wohlfarth, E.P. (North-Holland Publishing Company, 1980), p. 189.Google Scholar