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Effects of Different Methods of Calculating Mixed Depth Upon The Mixing Rates During Ion Beam Mixing*

Published online by Cambridge University Press:  25 February 2011

D. B. Poker  and
B. R. Appleton
D. B. Poker
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
B. R. Appleton
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
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Abstract

The linearity of mixing rates of ion-beam mixing of metals on silicon has been found to depend critically upon the method by which the mixed depth is calculated. For nonstoichiometric mixing, several methods of calculating the mixed depth may be used, namely: integrated area, halfheight, moment, error function, and 10%-90%. When applied to the same data, these methods can yield divergent results, from linear to square-root dependences of the mixed depth upon the mixing dose. For stoichiometric mixing, the calculation of mixed depth is more straightforward, but different methods of calculation still yield widely differing results. Possible causes for these discrepancies are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 45: Symposium A – Ion Beam Processes in Advanced Electronic Materials and Device Technology , 1985 , 171
Copyright
Copyright © Materials Research Society 1985

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Footnotes

*

Research sponsored by the Division of Materials Sciences, U.S. Department of Energy under contract DE-AC05-840R21400 with Martin Marietta Energy Systems, Inc.

References

REFERENCES

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