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Effect of Growth Conditions on Defect-related Photoluminescence in ZnO Thin Films Grown by Plasma Assisted MBE

Published online by Cambridge University Press:  01 February 2011

Vitaliy Avrutin
Affiliation:
vavrutin@vcu.edu, Virginia Commonwealth University, Electrical Engineering, 601 West Main St., Richmond, VA, 23284, United States, (804) 827 7000 ext. 357, (804) 828 4269
Mikhail A. Reshchikov
Affiliation:
mreshchi@vcu.edu, Virginia Commonwealth University, Physics, 1020 West Main St., Richmond, VA, 23284, United States
Natalia Izyumskaya
Affiliation:
nizioumskaia@vcu.edu, Virginia Commonwealth University, Electrical Engineering, 601 West Main St., Richmond, VA, 23284, United States
Ryoko Shimada
Affiliation:
rshimada@vcu.edu, Virginia Commonwealth University, Electrical Engineering, 601 West Main St., Richmond, VA, 23284, United States
Hadis Morkoç
Affiliation:
hmorkoc@vcu.edu, Virginia Commonwealth University, Electrical Engineering, 601 West Main St., Richmond, VA, 23284, United States
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Abstract

The effect of growth conditions on the luminescence properties of ZnO films grown on a-Al2O3/GaN(0001)/c-Al2O3 templates by plasma-assisted molecular beam epitaxy has been investigated. We observed that the deflecting of the ions produced by the RF oxygen plasma away from substrate results in improved excitonic emission and modification of the defect-related PL spectrum. The intensity of the near-band-edge lines in photoluminescence spectra from the layers grown with the ion deflector deflection was found to increase as compared to the controls grown without the ion deflector. The yellow-green spectral range was dominated by different defect bands in the films grown with and without ion deflection. The effect of RF power on peak positions of the defect band was studied for the films grown without ion deflection.

Type
Research Article
Copyright
Copyright © Materials Research Society 2008

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