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Effect of Abrasive in Cu-CMP Slurry on Global Planarization
Published online by Cambridge University Press: 15 March 2011
Abstract
We investigated the mechanical effect of an abrasive in an abrasive-free-like (AFL) slurry using CMP evaluation and ζ potential evaluation. The amount of abrasive strongly influenced CMP performance. We found out the optimum amount of abrasive for optimal CMP performance. The ζ potential of the abrasive was positive, and those of the Cu and barrier metal were negative. We discussed a planarization model of the AFL slurry in detail based on the ζ potential results obtained.
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- Research Article
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- Copyright © Materials Research Society 2004
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