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The Early Stages of Microwave-Assisted Chemical Vapor Deposition of Diamond on Fused Silica Substrates

Published online by Cambridge University Press:  25 February 2011

J. Rankin ,
Y. Shigesato ,
R.E. Boekenhauer ,
R. Csencsits ,
D.C. Paine  and
B.W. Sheldon
J. Rankin
Affiliation:
Brown University, Division of Engineering, Providence, RI 02912
Y. Shigesato
Affiliation:
Brown University, Division of Engineering, Providence, RI 02912
R.E. Boekenhauer
Affiliation:
Brown University, Division of Engineering, Providence, RI 02912
R. Csencsits
Affiliation:
Brown University, Division of Engineering, Providence, RI 02912
D.C. Paine
Affiliation:
Brown University, Division of Engineering, Providence, RI 02912
B.W. Sheldon
Affiliation:
Brown University, Division of Engineering, Providence, RI 02912
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Abstract

The early stages of the microwave assisted chemical vapor deposition of diamond on fused silica and silicon substrates were examined with Raman spectroscopy and scanning electron microscopy. Grain size as a function of time was determined for both substrates. Grains formed on fused silica were larger, with smoother growth surfaces than those formed on silicon substrates under the same conditions. For deposition on silica, the particle morphology changes from cuboid to cubo-octahedral for deposition times between 5 and 15 minutes. Also, the glass surfaces were etched during the pretreatment and deposition stages. These results are discussed in terms of mass transport limited growth, and chemical interactions between the gas-phase and the substrate surface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 270: Symposium M – Novel Forms of Carbon , 1992 , 317
Copyright
Copyright © Materials Research Society 1992

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References

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