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Doping and beyond: towards a common model for the ohmic contact formation mechanism in the Au/Te/Au/-, AuGe/-, and Ge/Pd/n-GaAs systems

Published online by Cambridge University Press:  25 February 2011

K. Wuyts
Affiliation:
Instituut voor Kern- en Stralingsfysika, K. U. Leuven, Celestijnenlaan 200 D, B-3001 Leuven, Belgium
J. Watté
Affiliation:
Laboratorium voor Vaste Stof-Fysika en Magnetisme, K. U. Leuven, Celestijnenlaan 200D, B-3001 Leuven, Belgium
R. E. Silverans
Affiliation:
Laboratorium voor Vaste Stof-Fysika en Magnetisme, K. U. Leuven, Celestijnenlaan 200D, B-3001 Leuven, Belgium
H. MüNder
Affiliation:
Institut für Schicht-und Ionentechnik, KFA Jülich, Postfach 1913, D-5170 Jülich, Germany
M. G. Berger
Affiliation:
Institut für Schicht-und Ionentechnik, KFA Jülich, Postfach 1913, D-5170 Jülich, Germany
H. Luth
Affiliation:
Institut für Schicht-und Ionentechnik, KFA Jülich, Postfach 1913, D-5170 Jülich, Germany
M. Van Hove
Affiliation:
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
M. Van Rossum
Affiliation:
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
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Abstract

The results of our recent research on the ohmic contact formation mechanism in furnace alloyed Au/Te/Au/GaAs contacts are summarized, and preliminary Raman measurements on annealed Ge/Pd/GaAs structures are presented. The data and those reported in literature on the AuGe- and Ge/Pd- GaAs systems are argued to be more in agreement with the graded crystalline heterojunction concept (the formation of n+-Ge/GaAs, n+Ga2Te3/GaAs junctions) than with the doping model (the formation of n+-GaAs).

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

REFErences

[1] Kupka, R. K., and Anderson, W. A., J. Appl. Phys. 69, 3632 (1991)Google Scholar
[2] Sebestyen, T., Solid-State Electron. 25, 543 (1982)CrossRefGoogle Scholar
[3] Kirillov, D., and Chung, Y., Appl. Phys. Lett. 51, 846 (1987)Google Scholar
[4] Palmström, C. J., Schwarz, S. A., Yablonovitch, E., Harbison, J. P., Schwartz, C. L., Florez, L. T., Gmitter, T. J., Marshall, E. D., and Lau, S. S., J. Appl. Phys. 67, 334 (1990)Google Scholar
[5] Walukiewicz, W., Appl. Phys. Lett. 51, 2094 (1989)Google Scholar
[6] Wuyts, K., Langouche, G., Van Rossum, M., and Silverans, R. E., Phys. Rev. B 45, 6297 (1992)Google Scholar
[7] Wuyts, K., Watté, J., Vanderstraeten, H., Langouche, G., Silverans, R. E., Münder, H., Berger, M. G., Van Hove, M., Bender, H., and Van Rossum, M., Phys. Rev. B 45, 11863 (1992)Google Scholar
[8] Schwarz, S. A., Pudensi, M. A. A., Sands, T., Gmitter, T. G., Bhat, R., Koza, M., Wang, L. C. and Lau, S. S., Appl. Phys. Lett. 60, 1123 (1992)Google Scholar
[9] Wuyts, K., Watté, J., and Silverans, R. E., Appl. Surf. Sci. 54, 366 (1991)Google Scholar
[10] Münder, H., Andrzejak, C., Berger, M. G., Luth, H., Borghs, G., Wuyts, K., Watté, J., and Silverans, R. E., J. Appl. Phys. 71, 739 (1992)Google Scholar
[11] Wuyts, K., Watté, J., Langouche, G., Silverans, R. E., Zégbé, G., and Jumas, J. C., J. Appl. Phys. 71, 744 (1992)CrossRefGoogle Scholar
[12] Langouche, G., Schroyen, D., Bemelmans, H., De Raedt, W., de Potter, M., and Van Rossum, M., Mat. Res. Soc. Proc. 104, 527 (1988)Google Scholar
[13] Abstreiter, G., Bauser, E., Fisher, A., and Ploog, K., Appl. Phys. 16, 345 (1978)CrossRefGoogle Scholar
[14] Wright, S. L., Marks, R. F., Tiwari, S., Jackson, T. N., and Baratte, H., Appl. Phys. Lett. 49, 1545 (1986)CrossRefGoogle Scholar
[15] Illiadis, A., J. Vac. Sci. Technol. B 5, 1340 (1987)CrossRefGoogle Scholar
[16] Bruce, R. A., Moore, W. T., Lester, T., Clark, P. A., and Spring-Thorpe, A. J., Inst. Phys. Conf. Ser. 100, 671 (1989)Google Scholar
[17] Murakami, M., Price, W. H., Norcott, M., and Hallali, P. E., J. Appl. Phys. 68, 2468 (1990)Google Scholar
[18] Dornath-Mohr, M. A., Cole, M. W., Lee, H. S., Wrenn, C. S., Eckart, D. W., Fox, D.C., Yerke, L., Chang, W. H., Lareau, R. L., Jones, K. A., and Cosandy, F., J. Electron. Mat. 19, 1247 (1990)Google Scholar
[19] Stali, R. A., Wood, C. E. C., Board, K., Dandekar, N., Eastman, L. F. and Devlin, J., J. Appl. Phys. 52, 4062 (1981)Google Scholar
[20] Dubon-Chevallier, C., Blanconnier, P., Besombes, C., Mayeux, C., Bresse, J. F., Henoc, P., and Yao, Y., J. Electrochem. Soc. 137, 1514 (1990)Google Scholar