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Determination of Defect Densities by Constant Photocurrent Method – Comparison of AC and DC Methods

Published online by Cambridge University Press:  01 February 2011

Charlie. Main ,
Steve Reynolds ,
Ivica. Zrinšća  and
Amar Merazga
Charlie. Main
Affiliation:
University of Abertay Dundee, School of Computing and Advanced Technologies, Bell Street, Dundee DD1 1HG
Steve Reynolds
Affiliation:
University of Abertay Dundee, School of Computing and Advanced Technologies, Bell Street, Dundee DD1 1HG
Ivica. Zrinšća
Affiliation:
University of Abertay Dundee, School of Computing and Advanced Technologies, Bell Street, Dundee DD1 1HG
Amar Merazga
Affiliation:
Faculté des Sciences et Sciences de l'ingénieur, Université Mohammed Khidir, Biskra, Algéria
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Abstract

We report on discrepancies in the absorption spectrum of a-Si:H measured by DC and AC constant photocurrent methods (CPM). Our measurements reveal discrepancies in the absorption coefficient alpha, of up to an order of magnitude. DC measurement gives the higher value for alpha at photon energies below the Urbach tail. In this paper we examine free carrier generation paths in AC CPM, and the influence of these paths on the photocurrent frequency response to modulated sub-gap illumination. A simple kinetic model is used to attempt to explain quantitatively the differences in the photocurrent frequency response for sub- and super-gap excitation. At first sight the basic AC technique is of doubtful validity, even at exciting frequencies as low as 1 Hz, since maintaining a constant AC photocurrent does not guarantee a constant carrier lifetime. On the other hand, the DC method involves several parallel excitation paths, obfuscating attempts to extract a density of states from the absorption spectrum. We demonstrate that a simple variation of AC CPM can provide a more accurate means of determining the density of states than DC CPM.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 762: Symposium A – Amorphous and Nanocrystalline Silicon-Based Films – 2003 , 2003 , A19.12
Copyright
Copyright © Materials Research Society 2003

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