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Deposition of Thin Alumina Films from Supercritical Water Jets
Published online by Cambridge University Press: 25 February 2011
Abstract
Thin alumina films are grown on a silicon substrate, in vacuum, at a rate of about 10 Å per second, and at substrate temperatures below 1500C. Alumina is dissolved in supercritical water and the resulting solution expanded in a supersonic free jet, which is directed at the substrate. The films are characterized by ESCA and FTIR.
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