Hostname: page-component-8448b6f56d-c47g7 Total loading time: 0 Render date: 2024-04-19T00:37:50.500Z Has data issue: false hasContentIssue false

Current Status of SiC Power Switching Devices: Diodes & GTOs

Published online by Cambridge University Press:  10 February 2011

S. Seshadri
Affiliation:
ESSS, STC Northrop Grumman Corporation, 1350 Beulah Road, Pittsburgh, PA 15235–5098, sseshadr@ aeslcad.essd.pa.northgrum.com
A. K. Agarwall
Affiliation:
Currently at Cree Research, Inc. 4600 Silicon Drive, Durham, NC 27703
W. B. Hall
Affiliation:
Northrop Grumman Corporation, Baltimore, MD
S. S. Mani
Affiliation:
Currently at Sandia National Laboratory, Albuquerque, NM
M. F. MacMillan
Affiliation:
ESSS, STC Northrop Grumman Corporation, 1350 Beulah Road, Pittsburgh, PA 15235–5098, sseshadr@ aeslcad.essd.pa.northgrum.com
R. Rodrigues
Affiliation:
Silicon Power Corporation, Malvern, PA
T. Hanson
Affiliation:
Silicon Power Corporation, Malvern, PA
S. Khatri
Affiliation:
Silicon Power Corporation, Malvern, PA
P. A. Sanger
Affiliation:
ESSS, STC Northrop Grumman Corporation, 1350 Beulah Road, Pittsburgh, PA 15235–5098, sseshadr@ aeslcad.essd.pa.northgrum.com
Get access

Abstract

The progress that has been made in SiC diodes and GTOs is reviewed. A 100 A/1000 V SiC pi- n diode package, the highest current rating reported for any SiC device, a 69 A conduction/ 11 A turn-off of a SiC GTO and MTOTM, as well as the first all-SiC, 3 phase Pulse Width Modulated (PWM) inverter are reported, herein, for the first time. The inverter achieves voltage controlled turn off with a high temperature capable, hybrid SiC JFET. Material and process technology issues that will need to be addressed before device commercialization can be realized are discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Shenai, K., et al. IEEE Trans. Electr. Dev., V. 36–9, 1989, p. 18111.Google Scholar
2 Bhatnagar, M. and Baliga, B.J., IEEE Trans. Electr. Dev., V.40–3, 1993, p.645.10.1109/16.199372Google Scholar
3 Chow, T. P., Ramungul, N. and Ghezzo, M., Mat. Res. Soc. Symp. Vol. 483, 1998, p. 89.10.1557/PROC-483-89Google Scholar
4 Kimoto, T., Miyamoto, N. and Matsunami, H., IEEE Trans. Electr. Dev. V.46–3, (1999) P. 471.10.1109/16.748864Google Scholar
5 Neudeck, P. G., Huang, W. and Dudley, M., IEEE Trans. Electr. Dev. V.46–3, (1999) p. 478. See also Neudeck, P.G. and Fazi, C., IEEE Trans. Electr. Dev. V.46–3, (1999) p. 485.10.1109/16.748865Google Scholar
6 Mfitlehener, H., et al., Proc. Of 19989 Int'l. Symp. On Power Semicond. Devices & ICs (SPSD ‘98), Kyoto, Japan, June 3–6,1998, p.127.Google Scholar
7 Agarwal, A.K., Seshadri, S. and Rowland, L.B., IEEE Electr. Dev. Lett. V18, (1997) p. 592.10.1109/55.644081Google Scholar
8 Maranowski, M.M. and Cooper, J.A. Jr, IEEE Trans. Electr. Dev. V.46–3, (1999) p. 520.Google Scholar
10 Palmour, J.W., Singh, R., Lipkin, L.A. and Waltz, D.G., Trans. 3rd Int'l. Conf. on High Temp. Elec. (HiTEC) Alb. N.M. Vol 2, XVI-9–14, Jun, 1996.Google Scholar
10 Xie, Z., Fleming, J. and Zhao, J., IEEE Electr. Dev. Lett. 1995.Google Scholar
11 Li, B., Cao, L. and Zhao, J., IEEE Electr. Dev. Lett. (1998).Google Scholar
12 Xie, K., Zhao, J.H., Flemish, J.R., Burke, T., Buchwald, W.R., Lorenzo, G. and Singh, H., IEEE Elec. Dev. Lett. 17, 142 (1996).10.1109/55.485194Google Scholar
13 Mooken, j., Lewis, R., Hudgins, J.L., Agarwal, A.K., Casady, J.B., Siergiej, S. and Seshadri, S., Proc. 32nd IEEE Industry Applications Society (IAS) Conference, Oct. 5–9, New Orleans, LA 1997.Google Scholar