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Comparison of the Processes Induced by Mercury Lamp and ArF Excimer Laser Photoassisted CVD of a-Si:H Films
Published online by Cambridge University Press: 28 February 2011
Abstract
We compare, in this study, the photoassisted processes for silicon deposition using both a low pressure mercury lamp and an ArF excimer laser for the specific case where the SiH4 gas is sealed in the reaction chamber.
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